- Treffer 1 von 1
Zitieren Sie bitte immer diesen URN: urn:nbn:de:kobv:b43-560530
First of its kind: A test artifact for direct laser writing
- With Direct Laser Writing (DLW) maturing in all aspects as a manufacturing technology a toolset for quality assurance must be developed. In this work we want to introduce a first of its kind test artifact. Test artifacts are standardized 3D models with specific geometric feature to evaluate the performance of writing parameters. Test artifacts are already common in other 3D additive manufacturing technologies e.g. Selective Laser Melting. The test artifact introduced in this work was developed in particular to accommodate 1) the high geometrical resolution of DLW structures and 2) the limited possibilities to examine the resulting structure. Geometric accuracy, surface adhesion as well as confocal raman spectroscopy results were considered when evaluating the design of the test artifact. We will explain the individual features and design considerations of our DLW test artifact. The difference between two slicers, Cura and 3DPoli, and the implications on measured feature sizes and theWith Direct Laser Writing (DLW) maturing in all aspects as a manufacturing technology a toolset for quality assurance must be developed. In this work we want to introduce a first of its kind test artifact. Test artifacts are standardized 3D models with specific geometric feature to evaluate the performance of writing parameters. Test artifacts are already common in other 3D additive manufacturing technologies e.g. Selective Laser Melting. The test artifact introduced in this work was developed in particular to accommodate 1) the high geometrical resolution of DLW structures and 2) the limited possibilities to examine the resulting structure. Geometric accuracy, surface adhesion as well as confocal raman spectroscopy results were considered when evaluating the design of the test artifact. We will explain the individual features and design considerations of our DLW test artifact. The difference between two slicers, Cura and 3DPoli, and the implications on measured feature sizes and the general shape is quantified. The measured geometries are used to derive a general design guide for a specific combination of photoresist, laser power and scanning speed and to analyse the geometric accuracy of a structure produced using these guidelines.…
Autor*innen: | Sven FritzscheORCiD, Brian Richard PauwORCiD, Christiane Weimann, Heinz SturmORCiD |
---|---|
Dokumenttyp: | Preprint |
Veröffentlichungsform: | Graue Literatur |
Sprache: | Englisch |
Titel des übergeordneten Werkes (Englisch): | Preprints |
Jahr der Erstveröffentlichung: | 2022 |
Organisationseinheit der BAM: | 6 Materialchemie |
6 Materialchemie / 6.5 Synthese und Streuverfahren nanostrukturierter Materialien | |
6 Materialchemie / 6.6 Physik und chemische Analytik der Polymere | |
Veröffentlichende Institution: | Bundesanstalt für Materialforschung und -prüfung (BAM) |
Verlag: | MDPI |
Verlagsort: | Basel |
Aufsatznummer: | 2022100259 |
Erste Seite: | 1 |
Letzte Seite: | 29 |
DDC-Klassifikation: | Technik, Medizin, angewandte Wissenschaften / Ingenieurwissenschaften / Ingenieurwissenschaften und zugeordnete Tätigkeiten |
Freie Schlagwörter: | Direct Laser Writing; Multi photon lithography; Quality infrastructure; Test artifact; Two photon polymerization |
Themenfelder/Aktivitätsfelder der BAM: | Material |
Material / Nano | |
DOI: | 10.20944/preprints202210.0259.v1 |
URN: | urn:nbn:de:kobv:b43-560530 |
Zugehöriger Identifikator: | https://nbn-resolving.org/urn:nbn:de:kobv:b43-580951 |
Verfügbarkeit des Dokuments: | Datei für die Öffentlichkeit verfügbar ("Open Access") |
Lizenz (Deutsch): | Creative Commons - CC BY - Namensnennung 4.0 International |
Datum der Freischaltung: | 20.10.2022 |
Referierte Publikation: | Nein |
Schriftenreihen ohne Nummerierung: | Preprints der BAM |