Reduced basis method for source mask optimization
| Author: | Jan Pomplun, Lin Zschiedrich, Sven BurgerORCiD, Frank Schmidt, Jacek Tyminski, Donis Flagello, N. Toshiharu |
|---|---|
| Document Type: | In Proceedings |
| Parent Title (English): | Photomask Technology |
| Volume: | 7823 |
| First Page: | 78230E |
| Publisher: | Proc. SPIE |
| Year of first publication: | 2010 |
| DOI: | https://doi.org/10.1117/12.866101 |

