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- Thermogravimetry (1)
- Thin Layers (1)
- Thin film analysis (1)
- Thin polymer films (1)
- Ti6Al4V alloy (1)
- TiAl64V (1)
- Time of Flight - Secondary ion mass spectrometry (1)
- Time-of-Flight Secondary Ion Mass Spectrometry (1)
- Time-of-flight secondary ion mass spectrometry (ToF-SIMS) (1)
- Time-resolved analysis (1)
- Time-resolved coherent scattering (1)
- Time-resolved scattering (1)
- Titania (1)
- Titanium (1)
- Titanium oxide (1)
- Titration (1)
- ToF SIMS (1)
- Tools to combat scientific misconduct (1)
- Topas-nbio (1)
- Transition metal dichalcogenide (1)
- Transmission Kikuchi Diffraction (TKD) (1)
- Transmission electron microscopy (TEM) (1)
- Transparent conductive Oxides (1)
- Trinkwasser (1)
- Two photon polymerisation (1)
- Two-photon polymerisatio (1)
- UV-curing (1)
- Ultrakurzpuls-Laser (1)
- Ultrakurzpuls-Laserbearbeitung (1)
- Ultraschallunterstütztes Fräsen (1)
- Uncertainties (1)
- Upconversion nanoparticles (1)
- Verschleißreduktion (1)
- Viskosität (1)
- Werkstoffe (1)
- White light interferometric microscopy (1)
- Wide-bandgap semiconductors (1)
- Wirksumme (1)
- Workflows (1)
- X-Ray Spectroscopy (1)
- X-ray generation (1)
- X-ray instrumentation (1)
- X-ray spectrometer (1)
- X-ray spectroscopy (1)
- XRD (1)
- XRM (1)
- XUV scattering (1)
- Xray (1)
- Xray photo electron spectrocopy (1)
- attraktive Wechelwirkung (1)
- dispersion (1)
- electron microscopy (1)
- fluorescence standards (1)
- graphene related 2D materials (1)
- pH (1)
- particle size determination (1)
- qNMR (1)
- quality assurcance (1)
- sample preparation (1)
- single cell-ICP-ToF-MS (1)
- single particle-ICP-ToF-MS (1)
- surface group analysis (1)
- synthesis (1)
- Äquivalenzdurchmesser (1)
Organisationseinheit der BAM
- 6 Materialchemie (240)
- 6.1 Oberflächen- und Dünnschichtanalyse (143)
- 1 Analytische Chemie; Referenzmaterialien (63)
- 1.2 Biophotonik (56)
- 6.6 Physik und chemische Analytik der Polymere (38)
- 6.5 Synthese und Streuverfahren nanostrukturierter Materialien (37)
- 6.2 Material- und Oberflächentechnologien (34)
- 5 Werkstofftechnik (24)
- 4 Material und Umwelt (21)
- 5.4 Multimateriale Fertigungsprozesse (17)
Data quality is a vast term, which comprises the completeness, relevance (adequacy), and reliability of data. So far, many attempts to assure data quality have been pursued, and evaluation criteria for data quality have been established. One relatively novel but already well-known aspect of data quality refers to the concept of data FAIRness, which states that data should be: findable, accessible, interoperable and re-usable. In order to find, use, and access data, a user has to be guided properly. Such guidelines already exist for regulators and the scientific community. However, a ‘simple’ non-academic user from general society is very unlikely to be able to access or understand such data. Our objective in the H2020 project NANORIGO is to help and guide all types of users (i.e., scientists, regulators, industry workers, citizens, etc.) to access and make use of high-quality data and information from available and suitable data repositories in order to increase the transparency of and trust in nanotechnology.
Nanomaterials may have brought many beneficial innovations with them in our daily lives and and have become indispensable for the society. However, one needs to be concerned of the risks which are still unknown and not sufficietly studied and therefore there is a need for a nanorisk governance. At the core of nanorisk governance is gathering, processing and analysing reliable data which will be used for decision making. The challenge is to assure data reliability and transform it into knowledge. To address this challenge, we used analogy to technology readiness level (TRL) approach (developed by NASA), and elaborated knowledge readiness level (KaRL). KaRL is a nine-scale system to categorize data and knowledge (documents) into levels of readiness for particular purposes and to enhance readiness level by using quality and completeness filters, compliance requirements, nanorisk-related tools, stakeholders’ input. By our approach we addressed key issues in nanotechnology such as societal and ethical concerns, circular economy and sustainability, traceability of data, knowledge and decisions.
There is an urgent demand for reliable data on microplastic analysis, particularly on its physico-chemical properties as well as validated methodology to obtain such data. Through interlaboratory comparisons (ILCs) it becomes possible to assess accuracy and precision of methods by involving many laboratories around the world. At BAM, my tasks focused around organisation of an ILC on physico-chemical characterisation of microplastic detection methods under the international pre-standardisation platform VAMAS (www.vamas.org/twa45/) as Project 2 “Development of standardized methodologies for characterisation of microplastics with microscopy and spectroscopy methods” under the Technical Working Area TWA 45 “Micro and Nano Plastics in the Environment”.
With a proud number of 84 participants this ILC is able to provide superior statistical results. Thermoanalytical (Py-GC/MS and TED-GC/MS) and vibrational (µ-IR and µ-Raman) methods were asked for identification and quantification of microplastic test samples according to mass or particle number. Preliminary results indicate which methods show a higher accuracy and precision and reveal some sample preparation ideas which work best for microplastics characterisation. At the end of the ILC an overall plausibility of the results will be assessed.
To obtain reliable data on micro- and nanoplastics (MPs, NPs) BAM (Federal Institute for Materials Research and Testing) is organizing interlaboratory comparisons (ILCs). Main focus is detection and physico-chemical characterisation. The accuracy and precision of the results of different laboratories and comparability of the results among the participants are addressed. The ILCs will be performed in the following order: i) ILC #1: Detection and Characterisation of MPs (1-1000 µm) and ii) ILC #2: Detection and Characterisation of NPs (< 1 µm).
For the ILC #1 the parameters to be analysed are: particle size distribution, shape, mass content, particle concentration, with thermoanalytic (Py-GC/MS, TED-GC/MS) and spectroscopy (µ-Raman, µ-FTIR) methods. For the ILC #2 the parameters are: particle size distribution, shape, particle concentration, with methods such as spectroscopical (Raman), Electron Microscopies (SEM, AFM), etc. Exact measurands and methods are still under discussion. BAM will provide test materials of well-known stability and homogeneity. ILC participants will include partners of the CUSP (the European research cluster to understand the health impacts of micro- and nanoplastics), and any other institutions over the world. The ILCs will take place under the international pre-standardisation platform VAMAS, new Technical Working Area 35 “Micro and Nano Plastics in the Environment” (http://www.vamas.org/twa45/).
In this presentation we demonstrate the importance of physico-chemical properties (pc) of micro- and nanoplastic particles (MNPs). These properties determine interaction between MNPs and cells or living organisms. To perform accurate experiments for acquiring pc information it is essential to develop well-characterized and understood plastic reference materials. Such reference materials can be used in interlaboratory comparisons (ILCs). BAM is organizing under VAMAS two ILCs, on micro- and nanoplastics to obtain reliable results and methodologies for pc characterization of MNPs. By gaining profound knowledge on pc properties it becomes possible to estimate the impact of MNPs on the humans and environment and therefore to translate the knowledge to the level of regulation.
The research carried out at the Laboratory of Spectroscopy of Functional Materials at IFSC/USP, in Brazil, is focused on the synthesis and structural-property correlation of luminescent materials including rare-earth (RE) doped glasses, ceramics and hybrid host-guest materials. For the past five years, we have been particularly interested in the development of single- and multifunctional nanosystems based on core-shell upconversion nanoparticles (UCNP) associated with dyes, organometallic complexes and other organic molecules, for biophotonic and sensing applications. In these systems, we take advantage of energy transfer between the UCNPs and the molecules to either supress or enhance luminescent response. Examples include the possibility of bioimaging and photodynamic therapy of bacteria and cancer cells, simultaneous magnetothermia and thermometry, localized O2 sensing, fast detection and quantification of biological markers (e.g. kidney disease) and microorganisms. On what concerns the development of luminescent sensors - a recently started project, our aim is to develop paper-based platforms for point-of-care devices. In this presentation, an overview of our contributions for the past years and our future aims will be presented with several examples.
Es werden erzielte Ergebnisse des ultraschallunterstützen Schlichtfräsens einer schwer spanbaren FeNi-Legierung vorgestellt. Dabei wird der Einfluss der Amplitude der Ultraschallunterstützung auf die Zerspankraft sowie die Oberflächenintegrität untersucht, wobei ein besonderer Fokus auf die Passivkraft gelegt wird. Die Ultraschallunterstützung bedingt beim Schlichtfräsen der Alloy 36 im Vergleich zum konventionellen Fräsprozess eine signifikante Reduzierung der resultierenden Zerspankraft sowie der Rauheit. Außerdem werden oberflächennahen Druckeigenspannungen induziert. Eine Angehobene Osziallations-Amplitude beim ultraschallunterstützten Fräsen bewirkt eine Erhöhung des Anteils der Passivkraft an der resultierenden Zerspankraft sowie eine Erhöhung der oberflächennahen Druckeigenspannungen und eine Verringerung von Oberflächendefekten und Rauheitskennwerten.
Ellipsometry as optical metrology method for analysis of reference materials for nanoelectronics
(2024)
Electrical properties of materials at the nanoscale can be characterized using scanning microwave microscopes (SMM) and conductive atomic force microscopes (C AFM). However, the measurement results are difficult to compare since different setups and different reference standards are used. The development of new “out-of-lab” reference standards can contribute to the traceability and reliability of these scanning probe microscopy methods (SPM) and facilitate their broader industrial application.
In this study, we discuss the capability of optical methods such as ellipsometry for the characterization of existing and the development of new reference calibration samples for scanning microwave microscopy. Ellipsometry is a fast and non-destructive method, which enables very accurate determination of the layer thickness and the dielectric functions of the materials. Imaging ellipsometry is suitable for spatially resolved measurements when analyzing thin layers in microstructured samples.
We show how the electrical resistivity of indium tin oxide (ITO) layers in newly designed resistive calibration samples can be obtained from spectroscopic ellipsometric measurements. The extension of the measurement range into the mid-infrared region was necessary when analyzing ITO layers with low conductivity. This parameter was obtained by fitting a Drude function describing the absorption of the free carriers. The impact of the coating process conditions on the layer properties is discussed.
Imaging ellipsometry was applied for the characterisation of thin ITO and SiO2 layers in microstructured resistive and capacitance calibration kits. The uncertainties of determined layer thicknesses were specified according to standardized practice guides used in ellipsometry. We show how statistical fingerprint analysis of the measured ellipsometric transfer quantities can be used to validate the quality of potential reference materials for nano-electronics and to monitor the processing of structured samples.
Ellipsometry is a very powerful tool used for accurate material investigation in a wide wavelength range. It is a non-destructive and fast method. Imaging ellipsometry as a combination of optical microscopy and ellipsometry enables spatially resolved measurements when determining the layer thickness and dielectric properties of thin layers. It is known for its high polarisation sensitivity and high contrast for the surface structures. In this contribution we show the application of the imaging ellipsometry for detection of defects in energy materials and quality validation of possible reference materials for nano-electronics.
Defects in wide bandgap semiconductors, in homoepitaxial SiC and heteroepitaxial GaN layers on transparent SiC substrates, can be successfully detected and classified by means of imaging ellipsometry. Correlation of imaging ellipsometry results with results from complementary techniques such as white light interference microscopy as well as atomic force microscopy contribute to understanding of surface topography and defect formation mechanisms. We discuss the potential of different methods for analysing ellipsometric map data for monitoring the defect densities.
Electric properties of materials at the nanoscale can be investigated by means of scanning probe microscopy methods such as scanning microwave microscopy and conductive atomic force microscopy. However, development of new robust and easy-to-use calibration methods and calibration standards is essential to increase the traceability of these methods and allow their broad application in industry. We show how imaging spectroscopic ellipsometry can be used for development and monitoring of processing quality of patterned reference samples based on indium tin oxide (ITO) layer with different thickness and conductivity.
The presentation demonstrates an application of multi-scale optical imaging methods such as spectroscopic imaging ellipsometry and white light interference microscopy for the investigation of wide-bandgap semiconductors for power electronics. The capabilities of these methods for the development of new reference calibration samples for scanning microwave microscopes (SMM) and conductive atomic force microscopes (C AFM) are discussed.
Advanced Manufacturing and Advanced Materials have been identified by the European Commission as one of six Key Enabling Technologies (KETs), the full exploitation of which will create advanced and sustainable economies. Metrology is a key enabler for progress of these KETs. EURAMET, which is the association of metrology institutes in Europe, has addressed the vital importance of Metrology for these KETs through the support for the creation of a European Metrology Network for Advanced Manufacturing. The EMN for Advanced Manufacturing (AdvanceManu) was approved in June 2021 and held the formal kick-of meeting in October 2022. The EMN comprises both National Metrology Institutes (NMIs) from across Europe and other designated Institutes (Dis). The EMN is organized in three sections; Advanced Materials, Smart Manufacturing Systems and Manufactured components and products. The aim of the EMN is to engage with stakeholders in the field of Advanced Manufacturing and Advanced Materials (Large & SMEs, industry organisations, existing networks and academia) with the aim to prepare a Strategic Research Agenda (SRA) for Metrology for Advanced Manufacturing. In the shorter term, an orientation paper is aimed to be produce to in the context of the European Partnership for Metrology. In addition to the SRA, the EMN will establish knowledge and technology transfer and promotion plan. This includes leveraging the existing research results from the completed and running EMPIR JRP projects funded through EURAMET.
This presentation will outline the EMN for Advanced Manufacturing, describing the structures and goals, the route to the production of the SRA and the progress made to date identifying the key metrology challenges across the related Key Industrial Sectors (KICs). In particular, the presentation aims to inform the community on how to be involved in the shaping of the strategic research agenda for the future of Metrology for Advanced Manufacturing and Advanced Materials.
The progress of Advanced Manufacturing, which has been identified by the European Commission as a Key Enabling Technology (KET) for future economic and societal progress is strongly reliant on the development of metrology capabilities. EURAMET, the association of metrology institutes in Europe, has established metrology research programs to address the metrology requirements across a spectrum of different thematic areas. In order to leverage the benefits of these developments on the wider industrial landscape, a high-level coordination of the metrology community supporting the Advanced Manufacturing landscape is required. This coordination is aimed to be achieved by the establishment of European Metrology Networks (EMNs), which are intended by EURAMET to provide a sustainable structure for stakeholder engagement and support. The joint networking project 19NET01 AdvManuNet funded by EMPIR for 4 years, started in June 2020 and aims to accelerate the process of establishing an EMN to strengthen Europe’s position in Advanced Manufacturing. The AdvManuNet project aims to support the establishment of an EMN on Advanced Manufacturing via the following specific aims:
1. Creation of a single hub for stakeholder engagement across the landscape of various industrial sectors including relevant societies and standardization bodies.
2. Development of a Strategic Research Agenda (SRA) and roadmaps for Advanced Manufacturing metrology based on the stakeholder engagement activities, considering current gaps in metrological capabilities existing networks and roadmaps.
3. Establish a knowledge-sharing program for Advanced Manufacturing stakeholders, promoting the dissemination and exploitation of the results of the project, including those from previous EU funded research projects.
4. Development of a sustainable web-based platform and service desk for Advanced Manufacturing stakeholders to allow for easy access to European metrology capabilities and support the wider advanced manufacturing community with metrology-based requirements.
5. Develop a plan for a coordinated and sustainable European metrology infrastructure for Advanced Manufacturing via a European Metrology Network.
The project concept followed by the scope and definition of Advanced Manufacturing will be described. The analysis of the current capability of metrology for Advanced Manufacturing and the preliminary concepts for the strategic research agenda will be presented with a focus on dimensional metrology.
In this work, Mie resonances in single Si nanoparticles (NPs) of different sizes have been systematically studied, using dark field (DF) and cathodoluminescence (CL) spectroscopy. An analytical method has been developed to compare experiment with theory.
Experimental CL spectra are averaged over entire Si NPs, allowing for direct comparison to DF spectra of identical NPs. Theoretical spectra clarify the assignment of Mie resonances within the NP which contribute with different intensity in DF and CL, resulting in an apparent spectral shift. Furthermore, a substrate effect appears. A 100 nm-Si NP on 15 nm SiN results in a broad peak, spectrally in between that of the calculated electric and magnetic dipole, a NP on 50 nm SiN exhibits two separated peaks as theoretically predicted. High spatial resolution of electron beam excitation allows to study the spectral CL changes at varying beam impact parameters. Theory and experiment agree that depending on beam position within a small Si NP, relative intensity of electric and magnetic dipole change; electric dipole vanishing in the center of the NP. Similar results are found for larger (d = 210 nm) Si NPs although the mode assignment is challenging as higher order modes appear and overlap with others.
In conclusion, comparison of CL and DF spectra is not trivial, in fact, excitation/radiation of distinct Mie resonances within a single Si NP are dependent on beam placement. However, substrate effects need to be considered in CL.
Cathodoluminescence (CL) spectroscopy has become a powerful tool to study nanostructures due to its high spectral and spatial resolution down to sub-nanometer. More recently, CL technique has also been used for second order auto-correlation measurements (g(2)(t)) to identify different single photon emitters and photon bunching in different materials [1-2].
In this work, tungsten disulfide (WS2) monolayers encapsulated in hexagonal boron nitride (hBN) with and without monocrystalline Au nanodisks (NDs) have been studied, using CL and PL spectroscopy as well as g(2)-CL- and PL-measurements.
CL and PL maps of different WS2 monolayers before/after Au ND deposition show a narrow peak at ~625 nm without any background emission. In CL, the hBN not only protects WS2 from the electron beam but also acts as a charge carrier sink which substantially increases the CL signal [3]. A further CL enhancement is achieved by Au ND deposition, exhibiting the maximum at the center of the NDs without any size dependence. The PL intensity is unaffected. This indicates that Purcell enhancement cannot be the underlying mechanism.
Furthermore, a giant CL-photon bunching of the hBN-encapsulated WS2 monolayers is found which is independent of the applied voltage but highly dependent on the electron beam current. At the lowest current of ~2 pA, a CL bunching factor of up to 160 is observed. Varying thicknesses of the surrounding hBN increases the overall CL signal but does not affect the bunching factor, though it exhibits small local changes within the same flake. In contrast, there is no PL correlation (g(2)(0) = 1).
Interestingly, this photon bunching can be further increased by Au NDs, resulting in the highest ever observed bunching factor of close to 2200. Once again, this enhancement is independent of the Au ND’s diameter although some disks show higher bunching factors than others. Most likely, the Au acts as shield for the incoming primary electrons, resulting in an even further decreased current, and thereby, increased bunching.
In conclusion, large CL-photon bunching is found in hBN-encapsulated WS2 monolayers which can be substantially enhanced by Au NDs.
References
[1] M.A. Feldmann, E.F. Demitrescu, D. Bridges, M.F. Chisholm, R.B. Davidson, P.G. Evans, J.A. Hachtel, A. Hu, R.C. Pooser, R.F. Haglund, B.J. Lawrie, Phys. Rev. B, 97, 081404(R) (2018)
[2] S. Meuret, L.H.G. Tizei, T. Cazimajou, R. Bourrellier, H.C. Chang, F. Treussartm M. Kociak, Phys. Rev. Letter, 114, 197401 (2015)
[3] S. Zheng, J.-K. So, F. Liu, Z. Liu, N. Zheludev, H.J. Fan, Nano Lett., 17, 6475-6480 (2017)
Influence of oxidation in the formation and performance of laser-induced periodic surface structures
(2022)
The fabrication of laser-induced periodic surface structures (LIPSS) has been reported for metallic, semiconductor and dielectric materials when irradiated with linearly polarized ultrashort laser pulses. Different sets of processing parameters have been identified and extensively studied, allowing the use of LIPSS for applications in medicine, tribology and surface wetting to name a few. One important parameter that is often not considered is the laser-induced oxidation that is produced especially when oxidation prone materials are irradiated in air environment. This surface oxidation can potentially influence the final structures
size, shape and orientation and modify their functionality in some specific applications.
In this work, we first study the influence of the laser-induced oxidation layer on the formation of LIPSS by characterizing the response of the oxidation prone
hard-coating material chromium nitride. Moreover, we employ complementary surface and depth-profiling analytic techniques to reveal morphological, chemical and structural features of different types of surface structures and LIPSS produced on titanium-based substrates. Finite-difference time-domain (FDTD) calculations finally explain how this superficial oxidation layer promotes the formation of a new type of low spatial frequency LIPSS. Also, we measure the depth-extent of the different oxides formed and demonstrate its beneficial influence for friction reduction and wear resistance applications.
Silicon is the material responsible for most of the technological developments during the past century, making it one of the most studied materials along different disciplines. However, there are still unturned stones regarding its superficial re-solidification after femtosecond laser-induced local melting. In this presentation, we report irradiation experiments with single femtosecond pulses (790 nm, 30 fs) with a spatially Gaussian distribution on two different types of silicon with orientations <111> and <100>. The surface modifications were studied in detail via different techniques, including optical microscopy, atomic force microscopy, spectroscopic imaging ellipsometry, energy dispersive X-ray spectroscopy and high-resolution transmission electron microscopy. We quantitatively estimate the resulting radial amorphous layer depth profiles with maximum thicknesses around some tenths of nanometers for fluences in between the melting and ablation thresholds. In particular, spectroscopic imaging ellipsometry (SIE) allowed fast data acquisition using multiple wavelengths to provide experimental measurements for calculating the nanometric radial amorphous layer thickness profiles with micrometric lateral resolution based on a thin-film layer model. SIE proved to be capable of detecting and measuring nanometric structural and chemical modifications (oxidation) on the studied laser spots. The accuracy of the SIE-based calculations is verified experimentally by characterizing an in-depth material lamella via high-resolution transmission electron microscopy (HRTEM) and energy dispersive X-ray spectroscopy (STEM-EDX). For completeness, we present a mathematical modelling for the melt layer thickness considering different optical absorption processes including one photon absorption, two photon absorption and free-carrier absorption, highlighting the relevance of the latter one in the femtosecond laser-induced melting of silicon.
Laser-induced oxide graded layers may contribute to the formation of a new type of embedded low-spatial frequency LIPSS with an anomalous orientation parallel to the laser polarization. In this contribution, we explore this effect experimentally with femtosecond laser pulses and numerically by finite-difference time-domain (FDTD) calculations.
Force-distance curves have been recorded on thin films of lubricants. The lubricants wet the AFM tip, which causes a capillary force. This force depends on the shape of the tip, as well as on physical properties like viscosity and surface tension, which have been determined additionally with other methods. This way, their influence on the shape of the curves could be analyzed.
Nanomaterials are used in many different applications in the material and life sciences. Examples are optical reporters, barcodes, and nanosensors, magnetic and optical contrast agents, and catalysts. Due to their small size and large surface area, there are also concerns about their interaction with and uptake by biological systems. This has initiated an ever increasing number of cyctoxicity studies of nanomaterials of different chemical composition and surface chemistry, but until now, the toxicological results presented by different research groups often do not address or differ regarding a potential genotoxicity of these nanomaterials. This underlines the need for a standardized test procedure to detect genotoxicity.1,2
Aiming at the development of fast, easy to use, and automatable microscopic methods for the determination of the genotoxicity of different types of nanoparticles, we assess the potential of the fluorometric γH2AX assay for this purpose. This assay, which can be run on an automated microscopic detection system, relies on the determination of DNA double strand breaks as a sign for genotoxicity.3 Here, we present first results obtained with broadly used nanomaterials like CdSe/CdS and InP/ZnS quantum dots as well as iron oxide, gold, and polymer particles of different surface chemistry with previously tested colloidal stability. These studies will be also used to establish nanomaterials as positive and negative genotoxicity controls or standards for assay performance validation for users of this fluorometric genotoxicity assay. In the future, after proper validation, this microscopic platform technology will be expanded to other typical toxicity assays.
References. (1) Landsiedel, R.; Kapp, M. D.; Schulz, M.; Wiench, K.; Oesch, F., Reviews in Mutation Research 2009, 681, 241-258. (2) Henriksen-Lacey, M.; Carregal-Romero, S.; Liz-Marzán, L. M., Bioconjugate Chem. 2016, 28, 212-221. (3) Willitzki, A.; Lorenz, S.; Hiemann, R.; Guttek, K.; Goihl, A.; Hartig, R.; Conrad, K.; Feist, E.; Sack, U.; Schierack, P., Cytometry Part A 2013, 83, 1017-1026.
BAM provides leading expertise in preparation, characterisation and application of fluorescent reference standards and biomedical relevant nanomaterials, as well as in traceable, absolute, and quantitative fluorometric measurements of transparent and scattering systems in the ultraviolet, visible, and near infrared spectral region. BAM will prepare solid low-RI particles in WP1, will develop reference methods to determine the fluorescence intensity and RI of reference materials in WP2, and will measure the fluorescence intensity of EVs in biological test samples of WP3.
Standardisation of concentration measurements of extracellular vesicles for medical diagnoses
(2020)
Extracellular vesicles (EVs) are cell-derived particles in body fluids, which have excellent potential as next generation biomarkers for the early diagnosis of common diseases, such as cancer and thrombosis. This project aims to tap into the clinical potential of EVs by developing traceable measurements of number concentration, size distribution, refractive index (RI) and fluorescence intensity of cell-specific EVs in human blood and urine.
To realise our aims, we will develop synthetic reference materials with physical properties resembling EVs (WP1), instrumentation and procedures to standardise EV measurements in clinical laboratories (WP2), and ready-to-use biological test samples (WP3). These will then be evaluated in an inter-laboratory comparison study across a range (>20) of standard flow cytometers in clinical labs (WP4).
The aim of task 1.4 within the EMPIR project 18HLT01 MetVesII is to produce low-RI solid particles with an effective RI between 1.37 and 1.42. To prepare these low-RI solid particles, polymer cores will be coated with a silica shell. Although the bulk RI of polymers, such as polystyrene (RI = 1.59) and PMMA (RI = 1.49), and fused silica (RI = 1.46) are higher than desired, an effective RI below 1.42 will be achieved by using a mesoporous silica shell with tuneable shell-thickness and a polymer core with sufficiently small size. This approach has four advantages: (1) monodisperse commercial polymer particles and silica shell chemistry are available, (2) low-RI solid particles will have a tuneable size and RI, (3) fluorescence can be added by incorporating fluorescent dyes into the polymer cores via an established staining procedure, and (4) fluorescent dyes within the polymer cores are shielded against influences from the sample matrix, e.g. fluorescence quenching effects altering the emission properties of the reference materials.
Formation of interphases between inorganic nanofillers and thermoplastic matrices are usually correlated to short-range interactions which does not exceed more than tens of nanometers away from the surface of the filler. Nevertheless, in nanocomposites with thermosetting matrices, the effect of nanofillers on the properties of the matrix is not limited to the immediate vicinities, but a long-range property alteration of the bulk polymer may be observed. The interaction between nanofillers and the polymer can disturb the curing reaction and alters the chemical, physical and mechanical properties of the polymer network in the matrix phase. In our studies, we aim to investigate short and long-range interphases of a nanocomposite system consisting of a thermosetting matrix (DGEBA) filled with an inorganic nanoparticle (boehmite). For this purpose, a combination of atomic force microscopy (AFM)-based approaches is implemented. Scanning kelvin probe microscopy (SKPM) was used to map the compositional contrast and the interphase with different electrical properties than the bulk. The mechanical properties of the interphase were probed by high resolution intermodulation AFM. (ImAFM). Furthermore, infrared spectroscopy AFM (AFM-IR) is used to investigate the chemical structure of the matrix at different distances from the nanoparticle. SKPM and (AFM-IR) measurements both show a long-range (to 10 µm) effect of boehmite on the chemical structure and surface potential of the bulk epoxy, respectively, whereas ImAFM force measurements reveals a short-range mechanical interphase between the filler and the matrix. The AFM-IR demonstrated the existence of unreacted anhydride hardener at the interphase. This indicates the preferential absorption of anhydride on the surface of boehmite. The consequence of such a selective interaction between the inorganic filler and the epoxy components is disturbance of the epoxy-hardener stoichiometric ratio, the curing mechanism. and the alteration of bulk properties of the matrix.
The modern economy is dependent on catalysis, which is main efforts to create environmentally and energy-friendly technologies. The storage of excess electrical energy into chemical energy by splitting water into hydrogen and oxygen is a feasible solution to this energy demand. Due to their abundance on Earth and inherent stability in alkaline solution, transition-metal oxides have become one of several viable alternatives to noble-metal catalysts. Since NiFe oxide is one of the most active oxygen evolution reaction (OER) electrocatalysts for alkaline water electrolysis, it has been the subject of extensive research.
In this work, NiFe2O4 nanoparticles (NPs) of various sizes, specific stoichiometric and non-stoichiometric Fe:Ni surface ratios are synthesized. we will use a combination of ultra-high vacuum surface analysis techniques, such as time-of-flight secondary ion mass spectrometry (TOF-SIMS) and X-ray photoelectron spectroscopy (XPS), to obtain the detailed characterization of the OER electrocatalysts top-surface layer, which is required to identify the rate-limiting step intermediates, and surface morphological changes at the electrolyte/catalyst.
Simulational tools are applied to investigate the physical properties of nanoparticles.
For the description of radioactive gold nanoparticles, particles scattering simulations are performed with the Geant4 monte carlo simulation toolkit.
The temperature dependent behaviour of the magnetization dynamics of different magnetic nanoparticles are simulated with the object oriented micormagnetic framework (OOMMF).
X-ray photoelectron-spectroscopy (XPS) allows simultaneous irradiation and damage monitoring. Although water radiolysis is essential for radiation damage, all previous XPS studies were performed in vacuum. Here we present near-ambient-pressure XPS experiments to directly measure DNA damage under water atmosphere. They permit in-situ monitoring of the effects of radicals on fully hydrated double-stranded DNA. Our results allow us to distinguish direct damage, by photons and secondary low-energy electrons (LEE), from damage by hydroxyl radicals or hydration induced modifications of damage pathways. The exposure of dry DNA to x-rays leads to strand-breaks at the sugar-phosphate backbone, while deoxyribose and nucleobases are less affected. In contrast, a strong increase of DNA damage is observed in water, where OH-radicals are produced. In consequence, base damage and base release become predominant, even though the number of strand-breaks increases further.
The progress in the VAMAS Project #15" Measurement of particle size and shape distribution of bipyramidal titania including deposition from liquid suspension" within TWA 34 Nanoparticle Populations is presented with highlight of the following points:
- Determine and compare particle size and shape distribution by means of:
• electron microscopy (SEM, TEM, STEM-in-SEM)
• atomic force microscopy (AFM)
• small angle X-ray scattering (SAXS)
- Determine uncertainty induced by deposition protocol from liquid suspension with comparison to known values from a prior ILC with already deposited nanoparticles on TEM grids.
- Provide comparative validation of protocols for the techniques other than TEM.
The progress of the VAMAS Project 16 "Measurement of (relative) number concentration of bimodal silica nanoparticles including deposition from liquid suspension" in TWA 34 Nanoparticle Populations is presented. Follwowing points are discusssed:
- Validate the performance of imaging methods to measure the relative number concentration
• electron microscopy (SEM, TEM) and atomic force microscopy (AFM)
• two modes of bimodal (30 and 60 nm) silica nanoparticles
- Validate the performance of small angle X-ray scattering (SAXS) for the traceable measurement of the number concentration of the two modes.
New analytic ways to characterise mesoporous thin layers used in electrocatalytic water splitting
(2024)
Mesoporous materials are needed in many applications where a high specific surface area and adsorptive behaviour is needed. Important examples are separation techniques and barrier layers and catalysts. Electrochemical water splitting is the key technology for producing green hydrogen and there is no foreseeable alternative to this process for producing elementary hydrogen from green electrical power. Water electrolysis can be divided into the anodic Oxygen Evolution Reaction (OER) and the cathodic Hydrogen Evolution Reaction (HER). Both processes have to be heavily optimised to a large extent to avoid energy losses caused by overvoltage. The development of electrodes for these processes is especially difficult due to the many boundary conditions. Water splitting is a catalytic as well as electrochemical process. The contact area between the electrolyte and the electrode must be maximised maintaining the stability of the surface. Side reactions must be suppressed, and effective gas transport must be ensured. The whole process has to be tolerant with respect to temperature, harsh chemical conditions from the electrolyte as well as high current densities.
We present a hybrid analytical method combining several analytical techniques for determining the properties of thin layers of mixed oxides of the general composition Ir:TiOx. These materials are promising candidates for electrocatalytical top coatings of OER electrodes. To lower the costs of the electrolysers, the main goal is to lower the Ir content retaining the system efficiency. The main properties which are hard to determine are the porous volume fraction and the Ir:Ti element ratio. By a combination of electron microscopy, spectroscopic operando ellipsometry, ellipsometric porosimetry, and other techniques, we can determine key features of mesoporous thin layer materials. We aim to develop operando capable techniques used in process monitoring as well as measurement techniques optimised for accuracy. By developing reference materials, we support long term uptake of our methodology. This work can directly be used for optimising electrocatalytic layers and is a good example for the power of hybrid metrology for improving materials design.
A competitive advantage in the semiconductors industry is gained through the exploitation of new materials and processes, translating into improved components’ performances. This requires a metrological infrastructure allowing reliable nanoscale characterisation of new materials and devices, particularly in terms of their electrical parameters and properties. Traceability and reliability of nanoscale measurements stand as a major challenge for electrical properties (i.e. resistance, impedance) using conductive atomic force microscopy (C-AFM) and scanning microwave microscopy (SMM) techniques. The non-destructive analysis nature of these two methods is of paramount importance for the characterization of devices and components. However, the state of the art still lacks established measurement protocols, easy to use reference standards, well-defined best practice guides and easy to use 3D models to assess environmental and external stimulation effects. Moreover, costly instrumentation, particularly for high-frequency measurements, still hinders efficient advancements in these directions.
ELENA is a 3-years European project that aims at bringing solutions to the aforementioned difficulties. To achieve this goal, the project uses a combination of nanoscale electrodynamic scanning probe methods in combination with optical tools such as spectroscopic ellipsometry on several lateral length scales to determine the electrical properties of layers and small structures.
Ellipsometry is a highly valuable technology for bridging different measurement methods. As a fast, highly sensitive, and non-destructive optical technique with low environmental requirements, it is ideal for transporting measurement accuracy and for up-scaling measurements in the production environment. It can be used for highly precise determination of properties, material identity and correctness confirmation, as well as defect detection.
Comparable, traceable, and accurate electrical measurements, especially at small scales are one of the biggest challenges in the development of the electrical and electronic devices of the future.
In this project, we develop structured thin layer systems of the transparent conductive material indium tin oxide (ITO) to prove the concept of using these systems as standards for conductivity and permittivity. The layers are produced in a reactive magnetron sputtering process from raw ITO targets with additional oxidation achieved by oxygen injection. We present results of a study correlating the coating process conditions with the properties of the final layer material. We found that especially the temperature development during coating is of key importance and determines the layer properties to a large extent. We will discuss questions of homogeneity and reproducibility of the coating processes used. The finished layers undergo lithographic structuring and etching to produce patterns to serve as reference structures for scanning probe electrical measurements. TCOs have a large variety of applications. In this work we also study the usability of ITO for other purposes and investigate the stability of this material under application conditions.
Compound semiconductors (CS) are promising materials for the development of high-power electrical applications. They have low losses, can withstand high temperatures and can operate at very high voltages and currents. This makes them a key technology for the electrification of many high energy applications, especially electromobility and HVDC power lines.
The challenge with CS technology is that most of the process technology has to be developed anew to the high standards required by electronic applications. Today, compound semiconductors can be produced in thin layers on top of substrates fabricated from classical crystal growth processes that are already well established. A promising method for this is metal organic vapour phase epitaxy (MOVPE). With this method, many different compounds with semiconducting properties can be synthesized. Additionally, this process technology is a direct thin layer deposition method. Therefore, complex multilayer systems can be generated directly by the deposition process and without the need of doping after growing.
There are a number of critical defects that can originate from the deposition process of these thin film devices. Within this project, we intend to develop new correlative imaging and analysis techniques to determine defect types, to quantify defect size and number density, as well as to characterise defects for process optimisation.
We report here on the use of spectroscopic ellipsometry and imaging ellipsometry to investigate defects in several different compound semiconductor materials used in high-power electronic devices. The materials we investigated are β-Ga2O3, SiC, GaN, AlN, and AlGaN materials as well as oxidised SiC surfaces. All of these materials have their typical defects and require optimised measurement and analysis schemes for reliable detection and analysis. Spectroscopic ellipsometry is a highly sensitive method for determining the thicknesses and dielectric function of thin layers, yielding potentially a high number of microscopic properties. The combined method between ellipsometry and optical microscopy is called imaging ellipsometry and is especially powerful for the large amount of data it produces. We have analysed defects in SiC- and AlN-based thin film semiconductors as well as characterised the properties of different types of SiO2 layers created on top of SiC monocrystals. We developed ellipsometric models for the data analysis of the different semiconductor materials.
If the defects have geometric features, it is useful to combine the ellipsometric analysis with topometry method like interference microscopy and scanning probe microscopy. We have successfully characterised function-critical defects in MOVPE SiC layers and correlated the findings with topography from WLIM measurements. We have developed an imaging ellipsometric measurement methodology that allows to estimate the relative defect area on a surface by a statistical raw data analysis.
Compound semiconductors (CS) are promising materials for the development of high-power electrical applications. They have low losses, can withstand high temperatures and can operate at very high voltages and currents. This makes them a key technology for the electrification of many high energy applications, especially electromobility and HVDC power lines.
The challenge is that most of the process technology has to be developed specifically and tailored to the high standards required by electronic applications. Today, many different CS materials can be produced in thin layers on top of substrates fabricated from classical crystal growth processes that are already well established. A promising method for this is metal organic vapour phase epitaxy (MOVPE). This technology is a direct thin layer deposition method capable of producing complex multilayer systems directly from one deposition process without the need of doping after growing.
There are a number of critical defects that can originate from the deposition process when targeting electronic thin film devices. Within this project, we intend to develop new correlative imaging and analysis techniques to determine defect types, to quantify defect size and density, as well as to characterise defects for further process optimisation.
We report here on the use of spectroscopic and multispectral imaging ellipsometry to investigate defects in several different compound semiconductor materials used in high-power electronic devices. The materials we investigated are β-Ga2O3, SiC, GaN, AlN, and AlGaN as well as oxidised SiC. All of these materials have their typical defects and require optimised measurement and analysis schemes for reliable detection and analysis. Spectroscopic ellipsometry is a highly sensitive method for determining the thicknesses and dielectric function of thin layers, yielding potentially a high number of microscopic properties. The combined method between ellipsometry and optical microscopy is known as imaging ellipsometry and is especially powerful for the large amount of data it produces. We have analysed defects in SiC- and AlN-based thin film semiconductors as well as characterised the properties of different types of SiO2 layers created on top of SiC monocrystals. We developed ellipsometric models for the data analysis of the different semiconductor materials.
If the defects have geometric features, it is useful to combine the ellipsometric analysis with topometry methods like interference microscopy and scanning probe microscopy. We have successfully characterised function-critical defects in MOVPE SiC layers and correlated the findings with topography from WLIM measurements. We have developed an imaging ellipsometric measurement methodology that allows to estimate the relative defect area on a surface by a statistical raw data analysis.
In this workpackage of the ELENA project, we develop a way to express the measurement uncertainty of nanoscale determination of electrical propserties. The method developed aims to be usable for industrial contexts and described in technical documents and standards drafts. Standards and reference samples are used to make traceable measurements available for the end user.
Plastic debris in micron and nanometer scale pollutes the nature all over the world. The potential dangers of these pollutants remain unpredictable. While risk assessment studies on microplastics are already popular, nanoplastic has not yet reached the same focus of investigation. The reason for this difference is simple: There is a "methodological gap" in the analytics of plastic particles with a diameter smaller than 1 µm. Submicron and nanoplastic particles are currently not detectable in environmental matrices. Therefore, it is important for researchers to have a well-characterized nanoplastic material, that serves as a reference for nanoplastics found in nature.
Our aim was to synthesize nanoplastics made from the most common used plastics such as polypropylene (PP). We found an easy way to form nanoparticles consisting of PP (nano-PP), adapting and improving the method presented for polystyrene (PS). Nano-PP was formed via a top-down method where the polymer was dispersed to acetone and then transferred to water. No additional surfactant is needed to obtain a dispersion which is stable for more than 35 weeks.
The success of forming nanoplastics and their size was detected via scattering methods, predominantly dynamic light scattering (DLS). The chemical analysis of the nanoplastics was performed via Fourier Transform Infrared spectroscopy. To examine the good stability of the nanoparticles, zeta potential measurements were performed, which revealed zeta potentials of -30 to -40 mV.
Plastic debris in micron and nanometer scale pollutes the nature all over the world. The potential dangers of these pollutants remain unpredictable. While risk assessment studies on microplastics are already popular, nanoplastic has not yet reached the same focus of investigation. The reason for this difference is simple: There is a "methodological gap" in the analytics of plastic particles with a diameter smaller than 1 μm. Submicron and nanoplastic particles are currently not detectable in environmental matrices. Therefore, it is important for researchers to have a well-characterized nanoplastic material, that serves as a reference for nanoplastics found in nature.
Our aim was to synthesize nanoplastics made from the most common used plastics such as polypropylene (PP) and polyethylene (PE). We found an easy way to form nanoparticles consisting of PP and PE (nano-PP/PE). Herein, nano-PP/PE was formed via a top-down method where the polymer was dispersed to acetone and then transferred to water. No surfactant is needed to obtain a dispersion which is stable for more than 35 weeks.
The success of forming nanoplastics and their size was detected via scattering methods, predominantly dynamic light scattering. The chemical analysis of the nanoplastics was performed via Fourier Transform Infrared spectroscopy. Furthermore, electron microscopy was used to complement the results. To examine the good stability of the nanoparticles, zeta potential measurements were performed, which revealed zeta potentials of -30 to -40 mV.
Nanoparticle Populations
(2022)
Two new projects P15 Measurement of particle size and shape distribution of bipyramidal titania including deposition from liquid suspension and P16 Measurement of (relative) number concentration of bimodal silica nanoparticles including deposition from liquid suspension have been started at VAMAS/TWA 34 under the lead of BAM. First results are presented and discussed.
Quantitative Microstructural Analysis - VAMAS TWA 37 & Liaison with ISO/TC 202 Microbeam Analysis
(2022)
The progress in activities on Microbeam Analysis under VAMAS/TWA 37 is reviewed. Particularly the liaison with the new projects within the ISO technical committee TC 202 is presented and discussed with respect to the possibility of identifying and launching related VAMAS projects. The recently started project FIB sample processing for TEM is highlighted. Need of more promotion for the engagement of more participants from industry and academia at national, European and international level is highlighted. Also, the competition with the other technical working areas (on 'nano' or materials-related) is critically discussed. Further, a short overview of the VAMAS areas of activities is given where Germany is involved. Planed regional VAMAS Workshops in Germany in 2023 are announced.
The main outcomes of the EMPIR project nPSize are presented and the suitability of the new capabilities, e.g. reference materials, sample preparation protocols, measurement procedures, and data analysis, to be standardized and implemented in accredited analytical laboratories is discussed. Complementation and/or filling gaps of published and ongoing standardisation projects on size, shape and number concentration measurements under ISO/TC 229/JWG 2 are offered.
The two VAMAS inter-laboratory comparisons resulted from the nSPize project and just started under TWA 34 Nanoparticle Populations (Projects #15 and #16) of bipyramidal TiO2 anatase and bimodal SiO2 nanoparticles are presented in detail.
Both essential aspects of the surface of solid matter, its morphology and chemistry, are studied traditionally at BAM starting in the 60’s with different cyclical research focus areas, mostly related either to applicative research or method development. In the recent years, the focus has shifted almost exclusively to the nano-analytics of advanced materials such as complex nanoparticles, (ultra)thin films/coatings, nanocomposites, 2D materials, energy materials, etc. This is also the reason why BAM has established recently the new Competence Center nano@BAM (www.bam.de/Navigation/DE/Themen/Material/Nanotechnologie/sichere-nanomaterialien.html) with the five sub-fields nanoCharacterisation, nanoMaterial, nanoSafety, nanoData and nanoTechnology. The link to the BAM central guidelines to the safety in technology and chemistry is given by the development of reference products such as reference measurement procedures, reference (nano)materials, and newly reference data sets. Thus, an internationally well-networked group in surface analysis has been established @BAM, with regular contributions to integral analytical characterization with metrological and standardization background.
Examples of newly developed methodical approaches will be given with an emphasis on correlative nano-analysis of morphology and chemistry of nanomaterials. Correlative imaging by STEM-in-SEM with high-resolution SEM and EDX, and further with AFM or the new technique TKD (Transmission Kikuchi Diffraction) will be explained on various examples of nanostructures, both as starting materials and embedded/functionalized nanoparticles in products. The unique analytical benefits of the Auger electron probe as a veritable nano-tool for surface chemistry will be highlighted. The panoply of advanced surface characterization methods @BAM is completed by discussing examples of hybrid analysis of the bulk of nanomaterials by X-ray Spectroscopy with the highest surface-sensitive methods X-ray Photoelectron Spectroscopy (XPS) and Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS). Particularly for the analysis of the surface chemistry of nanostructures, such as the completeness of the shells of core-shell nanoparticles or in-depth and lateral gradients of chemistry within mesoporous thin layers, the latter methods are inherent.
Other special developments like approaches for the quantitative determination of the roughness of particle surface by electron microscopy or for the quantitative determination of the porosity of thin mesoporous layers by electron probe microanalysis (EPMA) with SEM will be presented.