Rigorous simulations of 3D patterns on extreme ultraviolet lithography masks
Author: | Sven BurgerORCiD, Lin Zschiedrich, Jan Pomplun, Frank Schmidt |
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Editor: | Bernd Bodermann |
Document Type: | In Proceedings |
Parent Title (English): | Modelling Aspects in Optical Metrology III |
Volume: | 8083 |
First Page: | 80831B |
Publisher: | Proc. SPIE |
Year of first publication: | 2011 |
DOI: | https://doi.org/10.1117/12.889831 |