Investigation of 3D Patterns on EUV Masks by Means of Scatterometry and Comparison to Numerical Simulations
| Author: | Sven BurgerORCiD, Lin Zschiedrich, Jan Pomplun, Frank Schmidt, Akiko Kato, Christian Laubis, Frank Scholze |
|---|---|
| Document Type: | In Proceedings |
| Parent Title (English): | Photomask Technology 2011 |
| Volume: | 8166 |
| First Page: | 81661Q |
| Publisher: | Proc. SPIE |
| Year of first publication: | 2011 |
| DOI: | https://doi.org/10.1117/12.896839 |

