Rigorous simulations of 3D patterns on extreme ultraviolet lithography masks
| Author: | Sven BurgerORCiD, Lin Zschiedrich, Jan Pomplun, Frank Schmidt |
|---|---|
| Editor: | Bernd Bodermann |
| Document Type: | In Proceedings |
| Parent Title (English): | Modelling Aspects in Optical Metrology III |
| Volume: | 8083 |
| First Page: | 80831B |
| Publisher: | Proc. SPIE |
| Year of first publication: | 2011 |
| DOI: | https://doi.org/10.1117/12.889831 |

