Rigorous Simulation of 3D Masks
| Author: | Sven BurgerORCiD, Roderick Köhle, Lin Zschiedrich, H. Nguyen, Frank Schmidt, Reinhard März, Christoph Nölscher |
|---|---|
| Editor: | P. Martin, R. Naber |
| Document Type: | In Proceedings |
| Parent Title (English): | Photomask Technology |
| Volume: | 6349 |
| First Page: | 63494Z |
| Publisher: | Proc. SPIE |
| Year of first publication: | 2006 |
| URL: | http://arxiv.org/pdf/physics/0610218 |

