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Ultra-shallow chemical characterization of organic thin films deposited by plasma and vacuum-ultraviolet, using angle- and excitation energy-resolved XPS

  • Nitrogen (N)-rich organic thin films were deposited using both low-pressure plasma- and vacuum-ultraviolet-based techniques, from mixtures of ammonia (NH3) and ethylene (C2H4). These films were investigated using angle-resolved and excitation energy resolved X-ray photoelectron spectroscopy (ARXPS and ERXPS, respectively) in order to determine their sub-surface chemical profiles. These two techniques enable one to tune the “XPS 95%” information depth, z 95%, by varying either the angle or the excitation energy. Using a combination of both techniques, z 95% can be varied continuously from 0.7 to 11 nm. The surface-near chemistry is investigated using both high-resolution C 1s spectra and elemental concentrations derived from elemental peak intensities. Results show that while laboratory XPS, and even ARXPS, suggest homogenous surface chemistries, the novel combination of ARXPS and ERXPS points to the existence of a compositional profile in the extreme outer surface layer. OurNitrogen (N)-rich organic thin films were deposited using both low-pressure plasma- and vacuum-ultraviolet-based techniques, from mixtures of ammonia (NH3) and ethylene (C2H4). These films were investigated using angle-resolved and excitation energy resolved X-ray photoelectron spectroscopy (ARXPS and ERXPS, respectively) in order to determine their sub-surface chemical profiles. These two techniques enable one to tune the “XPS 95%” information depth, z 95%, by varying either the angle or the excitation energy. Using a combination of both techniques, z 95% can be varied continuously from 0.7 to 11 nm. The surface-near chemistry is investigated using both high-resolution C 1s spectra and elemental concentrations derived from elemental peak intensities. Results show that while laboratory XPS, and even ARXPS, suggest homogenous surface chemistries, the novel combination of ARXPS and ERXPS points to the existence of a compositional profile in the extreme outer surface layer. Our conclusions are supported by simulations using SESSA software.zeige mehrzeige weniger

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Metadaten
Autor*innen:Pierre-Luc Girard-Lauriault, J.-C. Ruiz, Thomas Gross, M. R. Wertheimer, Wolfgang UngerORCiD
Dokumenttyp:Zeitschriftenartikel
Veröffentlichungsform:Verlagsliteratur
Sprache:Englisch
Titel des übergeordneten Werkes (Englisch):Plasma chemistry and plasma processing
Jahr der Erstveröffentlichung:2011
Verlag:Plenum Publ. Corp.
Verlagsort:New York, NY, USA
Jahrgang/Band:31
Ausgabe/Heft:4
Erste Seite:535
Letzte Seite:550
Freie Schlagwörter:Depth profile; Plasma polymers; Synchrotron XPS; Vacuum ultraviolet photopolymers
DOI:10.1007/s11090-011-9306-3
ISSN:0272-4324
Verfügbarkeit des Dokuments:Datei im Netzwerk der BAM verfügbar ("Closed Access")
Datum der Freischaltung:19.02.2016
Referierte Publikation:Ja
Datum der Eintragung als referierte Publikation:07.07.2011
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