On the damage behavior of dielectric films when illuminated with multiple femtosecond laser pulses
- The physical effects reducing the damage threshold of dielectric films when exposed to multiple femtosecond pulses are investigated. The measured temperature increase of a Ta2O5 film scales exponentially with the pulse fluence. A polarized luminescence signal is observed that depends quadratically on the pulse fluence and is attributed to twophoton excitation of self-trapped excitons that form after band-to-band excitation. The damage fluence decreases with increasing pulse number, but is independent of the repetition rate from 1 Hz to 1 kHz at a constant pulse number. The repetition rate dependence of the breakdown threshold is also measured for TiO2 , HfO2, Al2O3, and SiO2 films. A theoretical model is presented that explains these findings.
Autor*innen: | M. Mero, B. Clapp, J.C. Jasapara, W. Rudolph, D. Ristau, K. Starke, Jörg KrügerORCiD, Sven Martin, Wolfgang Kautek |
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Dokumenttyp: | Zeitschriftenartikel |
Veröffentlichungsform: | Verlagsliteratur |
Sprache: | Englisch |
Titel des übergeordneten Werkes (Englisch): | Optical engineering |
Jahr der Erstveröffentlichung: | 2005 |
Verlag: | Dekker |
Verlagsort: | New York, NY |
Jahrgang/Band: | 44 |
Ausgabe/Heft: | 5 |
Erste Seite: | 051107-1-051107-7 |
Freie Schlagwörter: | Coatings; Laser materials; Laser-induced damage; Ultrafast phenomena |
DOI: | 10.1117/1.1905343 |
ISSN: | 0892-354X |
Verfügbarkeit des Dokuments: | Weder Datei noch physisches Exemplar vorhanden ("No Access") |
Datum der Freischaltung: | 19.02.2016 |
Referierte Publikation: | Nein |