Na has deliberately been incorporated into Cu(In,Ga)Se2 (“CIGSe”) chalcopyrite thin-film solar cell absorbers deposited on Mo-coated polyimide flexible substrates by adding differently thick layers of NaF in-between CIGSe absorber and Mo back contact. The impact of Na on the chemical and electronic surface structure of CIGSe absorbers with various Cu-contents deposited at comparatively low temperature (420 °C) has been studied using x-ray photoelectron and x-ray excited Auger electron spectroscopy. We observe a higher Nasurface content for the Cu-richer CIGSe samples and can distinguish between two different chemical Na environments, best described as selenide-like and oxidized Na species, respectively. Furthermore, we find a Cu-poor surface composition of the CIGSe samples independent of Na content and — for very high Na contents — indications for the formation of a (Cu,Na)–(In,Ga)–Se like compound. With increasing Nasurface content, also a shift of the photoemission lines to lower binding energies could be identified, which we interpret as a reduction of the downward band bending toward the CIGSe surface explained by the Na-induced elimination of InCu defects.
The chemical and electronic properties of a-
Si:H(B)/ZnO:Al and μc-Si:H(B)/ZnO:Al thin-film solar cell structures
are studied by hard X-ray photoelectron spectroscopy (HAXPES).
Using a combination of different X-ray excitation energies
and deliberate sample design, we were able to select the probed
volume, i.e., the silicon capping layer only or the silicon and zinc
oxide layer (including the buried interface). For the a-Si:H(B) material,
we find a higher deposition rate and a smaller value for the
modified Auger parameter than for μc-Si:H(B). In addition, we
find indications of a pronounced band bending limited to the very
surface of the a-Si:H(B) and the μc-Si:H(B) layers, which is more
distinct in the latter case.
Spatial variations in the chemical composition of the (Zn,Mg)O/CuIn(S,Se)2 thin-film solar cell interface were studied by photoemission electron microscopy (PEEM). Energy filtered PEEM
images indicate significant differences in the magnesium and zinc distribution. Local photoemission measurements reveal a relative difference in the derived Mg/(ZnþMg) composition of the (Zn,Mg)O material of up to (11.460.7)%, which can be expected to induce band gap
fluctuations of (60630) meV. Furthermore, local areas with significant accumulations of sodium could be observed.
The electronic structure of the interface between the boron-doped oxygenated amorphous silicon “window layer” (a-SiOx:H(B)) and aluminum-doped zinc oxide (ZnO:Al) was investigated using hard x-ray photoelectron spectroscopy and compared to that of the boron-doped microcrystalline silicon (μc-Si:H(B))/ZnO:Al interface. The corresponding valence band offsets have been determined to be (−2.87 ± 0.27) eV and (−3.37 ± 0.27) eV, respectively. A lower tunnel junction barrier height at the μc-Si:H(B)/ZnO:Al interface compared to that at the a-SiOx:H(B)/ZnO:Al interface is found and linked to the higher device performances in cells where a μc-Si:H(B) buffer between the a-Si:H p-i-n absorber stack and the ZnO:Al contact is employed.