Finite element simulation of light propagation in non-periodic mask patterns
Author: | Lin Zschiedrich, Frank Schmidt |
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Editor: | Toshiyuki Horiuchi |
Document Type: | In Proceedings |
Parent Title (English): | Photomask and Next-Generation Lithography Mask Technology XV |
Volume: | 7028 |
Publisher: | SPIE |
Year of first publication: | 2008 |
URL: | http://arxiv.org/pdf/0804.2587v1 |