Finite element simulation of light propagation in non-periodic mask patterns
| Author: | Lin Zschiedrich, Frank Schmidt |
|---|---|
| Editor: | Toshiyuki Horiuchi |
| Document Type: | In Proceedings |
| Parent Title (English): | Photomask and Next-Generation Lithography Mask Technology XV |
| Volume: | 7028 |
| Publisher: | SPIE |
| Year of first publication: | 2008 |
| URL: | http://arxiv.org/pdf/0804.2587v1 |

