Ingenieurwissenschaften und zugeordnete Tätigkeiten
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Thin polymeric films are of great importance of high number of high-tech applications for instance in sensors and nanoelectronics. Form the scientific point of view thin films with thickness below 100 nm are ideal model systems to study confinement effects on its properties for instance on the molecular relaxation processes. In this contribution an overview is presented about the behavior of different systems as investigated by nanosized relaxation spectroscopy like broadband dielectric spectroscopy employing nano structured capacitors and AC chip calorimetry complimented by ellipsometry. The systems considered are PVME1, PVME/PS blends2,3 P2VP4, PBAC5 and polysulfone6. Besides the film also the adsorbed layer on the substrate prepared by a leaching approach and investigated by AFM is considered.1,4-7. For these investigationsss it is found that the adsorbed layer itself exhibits a relaxation dynamics which might be assigned either to molecular motions or to adsorptions desorption kinetics.
The growth kinetics of the adsorbed layer of poly(2-vinylpiridine) on silicon oxide is studied using a leaching technique which is based on the Guiselin brushes approach. The adsorbed layer is grown from a 200 nm thick P2VP film for several annealing time periods at different annealing temperatures. Then the film is solvent-leached, and the height of the remaining adsorbed layer is measured by atomic force microscopy. At the lowest annealing temperature only a linear growth regime is observed, followed by a plateau. Here, the molecular mobility of segments is too low to allow for a logarithmic growth. At higher annealing temperatures, both linear and logarithmic growth regimes are observed, followed by a plateau. At even higher annealing temperatures, the growth kinetics of the adsorbed layer changes.
A linear growth followed by logarithmic growth kinetics is observed for short annealing time periods. For longer annealing time periods, an upturn of the growth kinetics is observed. At the highest annealing temperature, only a logarithmic growth regime is found. The change in the growth kinetics is discussed by an alteration in the structure of the adsorbed layer. Moreover, the interaction between the polymer segments and the substrate becomes weaker due to both enthalpic and entropic effects. Therefore, at high annealing temperatures the polymer segments might more easily desorb from the substrate.