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Anomalous surface composition in thin films of a poly(vinyl methyl ether) / polystyrene blend
(2017)
Highly surface-sensitive X-ray photoelectron spectroscopy at HE-SGM beamline revealed in the outermost region (< 2nm) of thin films (15 -65 nm) of PVME/PS blends a relative high amount of PS, whereas in slightly deeper regions PVME was enriched. Such enrichment of PVME in the whole near-surface region was proposed in former investigations based on conventional XPS studies.
A plethora of innovative materials are produced by depositing thin and ultrathin coatings on different substrates. For instance, hard disks able to store terabytes of information are based on multiple magnetic and non-magnetic nano-layers. Moreover, protectives coatings might be used to enhance the mechanical properties of substrate materials; for instance Zn-based coatings are used in the Al industry.
In this context, solid analytical techniques are required to provide fast multi-elemental chemical analyses with high depth resolution (to monitor the different layers) and high sensitivity (to detect major, minor and trace elements). Direct solid analytical techniques, including Secondary Ion Mass Spectrometry, Secondary Neutral Mass Spectrometry, Auger Electron Spectroscopy or X-Ray Photoelectron Spectroscopy provide very valuable information about the atomic chemical composition of the surfaces/coatings; however, they also have some major drawbacks, such as high operating costs, complex sample pre-treatment and handling, low sample throughput and/or severe matrix effects that result in difficult quantification procedures. In order to overcome some of these drawbacks Glow Discharge Mass Spectroscopy (GD-MS) is proposed as a complementary methodology that provides an ideal solution for fast and accurate bulk and layer analyses. In this work, we evaluate the advantages and limitations of this technique and we discuss about recent progresses and new applications.