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- Englisch (4)
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- Electromagnetic testing (3)
- Finite element method (3)
- Spherical defects (3)
- Kathodenbogen Ablagerung (1)
- Magnetron Zerstreuung (1)
- Titan nitrid (1)
- Wechselvorspannung (1)
TiN hard coatings have been prepared by unbalanced magnetron (UBM) sputtering and cathodic arc deposition using uni- and bipolar pulsed bias voltages. For UBM sputtering using a unipolar pulsed bias voltage the average substrate bulk temperature Ts was reduced to 220 °C without considerable loss of microhardness and adhesion by variation of the pulse parameters. Determination of the average energy Ep delivered to the growing film per deposited particle leads to values lower than the critical transition energy (150 eV atom-1) between open porous and dense coatings. Using a bipolar pulsed bias voltage Ts decreased with increasing duration ton+ of the positive bias pulse. It was found that Ep increased with increasing ton+ up to values found for d.c. bias voltage. The coatings prepared using a bipolar pulsed bias voltage at low Ts are dense and in compressive stress with acceptable microhardness and adhesion. First results of the investigation of TiN coatings prepared by cathodic arc deposition using unipolar pulsed bias are given.
The determination of magnetic distortion fields caused by inclusions hidden in a
conductive matrix using homogeneous current flow needs to be addressed in multiple tasks of
electromagnetic non-destructive testing and materials science. This includes a series of testing
problems such as the detection of tantalum inclusions hidden in niobium plates, metal inclusion in
a nonmetallic base material or porosity in aluminum laser welds. Unfortunately, straightforward
tools for an estimation of the defect response fields above the sample using pertinent detection
concepts are still missing. In this study the Finite Element Method (FEM) was used for modeling
spherically shaped defects and an analytical expression developed for the strength of the response
field including the conductivity of the defect and matrix, the sensor-to-inclusion separation and the
defect size. Finally, the results also can be useful for Eddy Current Testing problems, by taking the
skin effect into consideration.