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Polymeroberflächenfunktionalisierungen im gepulsten Plasma mit nachfolgender chemischer Behandlung
(2000)
Plasma-chemical bromination applied to graphitic materials, in particular to highly ordered pyrolytic graphite is reviewed. The resulting bromination efficiency of the plasma-chemical treatment was subject of systematic process optimization. The plasma of elemental bromine vapour produced bromine concentrations on graphene surfaces of more than 30 % Br/C using either inductively or capacitively coupled low-pressure radio-frequency plasmas. Plasma brominated graphite surfaces have been studied by Near Edge X-ray Absorption Fine Structure, X-ray Photoelectron Spectroscopy, Atomic Force Microscopy and Scanning Electron Microscopy. The introduction of bromine into graphene-like graphite layers and its binding situation were investigated. To study the physical effect of the plasma bromination process, Kr plasma was also used because of its chemical inertness but similar atomic mass. Covering the samples with a Faraday cage or with a LiF window should help to differentiate between physical, chemical and radiation effects of the plasma. Bromination was assigned to radical or electrophilic addition of bromine onto fully substituted aromatic double bonds (sp² C) with exothermal reaction enthalpy. Low bromination shows a strong decay of aromatic double bonds, higher bromination percentage let disappear all aromatic rings. The formed C–Br bonds were well suited for efficient grafting of organic molecules by post-plasma wet-chemical nucleophilic substitution. This grafting onto the graphene surface was demonstrated using aminosilane and different diamines. The bromination of double bonds changes the hybridization of carbon atoms from plane sp² to tetrahedral sp³ hybridization. Thus, the plane topography of graphene is destroyed and the conductivity is lost.
Reactions and Intermediates at the Metal-Polymer Interface - Detected by XPS and NEXAFS Spectroscopy
(1998)
The retention of chemical structure and functional groups during plasma polymerization was investigated. Usually plasma polymer layers, prepared by a continuous wave radio-frequency plasma, are often chemically irregular in their structure and composition. To minimize these irregularities low wattages and the pulsed plasma technique were applied to avoid fragmentations. The first goal was to produce plasma polymers comprising double or triple bonds as precursors for electrically conducting polymers. Acetylene, ethylene, butadiene and polystyrene were used as monomers and deposited as thin polymer films by pulsed plasmas of low wattages. Styrene polymerization was strongly enhanced in the dark phase (plasma off) of a pulsed r.f. plasma caused by the reactivity of the vinyl-type double bond. This could be confirmed by a verification of a rather high chemical regularity of the film sample. The oxygen content of this film measured by X-ray photoelectron spectrometry (XPS) was in situ 0% and after 24 h exposure to air lower than 1%. Additionally, post-plasma oxidations of trapped radicals with air could be suppressed using NO gas as radical quencher. Such quenched plasma polymer layers were completely stable against oxidation for a number of weeks. During the low-wattage pulse plasma polymerization metal atoms were simultaneously or layer by layer evaporated into the growing layer and in situ measured by XPS. These metal atoms are acting as dopants. Here, Li, K, Mg and Cr were used at different concentrations providing electrical conductivity and magnetic properties for the film.