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- 2013 (3) (entfernen)
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- Englisch (3)
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- Laser-induced damage threshold (2)
- Nanosecond laser (2)
- Defect model (1)
- FS-laser ablation (1)
- Fused silica (1)
- Laser processing (1)
- Optical fiber (1)
- Optical multimode fiber (1)
- Photovoltaics (1)
- Silicon nitride (1)
Optical fibers made of fused silica are a common method of transmitting high laser pulse energies. Failure of those fibers is a significant risk. The determination of laser-induced damage thresholds (LIDT) on fiber end facets according to ISO 21254 standard is needed. In the past, single pulse nanosecond laser experiments showed an improvement of LIDT with increasing fiber core diameter for 1064 nm wavelength and a constant beam diameter of 50 µm.
This paper pays particular attention to the influence of the laser beam diameter on damage resistance. All-silica fiber types (LEONI) with different core diameters (100–600 µm) were investigated using beam diameters in a range from 30 µm to 100 µm. For comparison experiments on fused silica preform material (Heraeus F300) were performed. On one hand, surface LIDT of fused silica preform material decreases significantly with increasing beam size. A model considering a random distribution of point defects explains the experimental data qualitatively. On the other hand, LIDT of fiber end facets stays constant. White light microscopy results suggest that the point defect density on fiber end facets is lower compared to the preform surface due to an excellent surface polish quality.
Because of the increasingly stringent requirements for fibers in high Performance applications, the Business Unit Fiber Optics of the Leoni Group and the German BAM Federal Institute for Materials Research and Testing are jointly tackling the challenge of investigating the damage thresholds of selected large core special fibers for the first time.
The removal of a 75- to 90-nm-thick passivating silicon nitride antireflection coating from standard textured multicrystalline silicon photovoltaic wafers with a typical diffused 90-Ω/sq-emitter upon irradiation with near-infrared femtosecond laser pulses (790 nm central wavelength, 30 fs pulse duration) is studied experimentally. The laser irradiation areas are subsequently characterized by complementary optical microscopy, scanning electron microscopy and depth profiling chemical analyses using secondary ion mass spectrometry. The results clarify the thin-film femtosecond laser ablation scenario and outline the process windows for selective antireflection coating removal.