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We report a new sequence selective terpolymerisation in which three monomers (butylene oxide (BO) A, PhNCS B and phtalic thioanhydride (PTA) C) are selectively enchained into an (ABA′C)n sequence. PTA/PhNCS/BO ring-opening terpolymerisation ROTERP can be coupled with CS2 ROTERP to generate tetrapolymers and with εDL ROP in switchable catalysis for blockpolymer synthesis.
Inspired by the chemistry of mussel adhesive proteins, polydopamine (PDA) exhibits strong adhesion to nearly any kind of organic or inorganic surface and shows high ability for surface post-modification and secondary reactions. As a result, PDA has been widely used as a base adlayer to enable versatile surface chemistry and functionalization. It has shown great potential in wide range of applications including biomedical field (e.g., drug delivery, adhesives, photothermal therapy, bone and tissue engineering, cell adhesion, biosensing). However, implementation of PDA in microdevices is still hindered by insufficient spatial and temporal control of excited deposition methods.
In this work we present a novel approach to fabricate tunable micropatterned substrates where mussel-inspired chemistry provides base for various surface modification [2]. Current approach applies Multiphoton Lithography (MPL) to initiate local PDA formation, and, therefore, does not require use of microstamp or photomask. As a result, the microstructures of complex designs can be produced with the spatial resolution down to 0.8 μm (Figure 1). The desired design can be easily altered by adjusting the stl model or the fabrication code. Unlike the conventional deposition of PDA based on dopamine auto-oxidation, our method does not require presence of strong oxidants, metal ions or alkaline pH. Herein-demonstrated deposition approach will significantly facilitate applications of polydopamine and other mussel-inspired materials in microdevices and high-resolution active microcomponents (e.g., in MEMS and microfluidics).
Adjustment of MPL parameters revealed that the morphology and thickness of resulted PDA microstructures can be controlled by altering the laser power and its scanning velocity. As a result, it also enables the production of micropatterns with structural gradient. Apart from the glass substrate, we performed PDA patterning at surfaces of different nature such as polychlorotrifluoroethylene, polydimethylsiloxane, polyethylene terephthalate, silicon wafers, and fluorinated glass coverslips. We tested different composition of dopamine solution for its ability of PDA buildup. Solutions containing Tris buffer, phosphate buffer or DI water only as well as different pH (6.0, 7.0 and 8.5) could be successfully applied for high-precision PDA micropatterning. Moreover, the effect of antioxidants and purging of the solution with oxygen and nitrogen was investigated. In all cases, no decrease of deposition efficiency was observed. The chemical nature of PDA was confirmed by locally recorded vibrational and x-ray photoelectron spectra. To ensure post-modification potential of MPL deposited PDA we demonstrated one-step deposition of micropatterns with trypsin. Obtained bio-functionalised surface can be further applied as a protein sensing active microelement.
With Direct Laser Writing (DLW) maturing in all aspects as a manufacturing technology a toolset for quality assurance must be developed. In this work we want to introduce a first of its kind test artifact. Test artifacts are standardized 3D models with specific geometric feature to evaluate the performance of writing parameters. Test artifacts are already common in other 3D additive manufacturing technologies e.g. Selective Laser Melting. The test artifact introduced in this work was developed in particular to accommodate 1) the high geometrical resolution of DLW structures and 2) the limited possibilities to examine the resulting structure. Geometric accuracy, surface adhesion as well as confocal raman spectroscopy results were considered when evaluating the design of the test artifact. We will explain the individual features and design considerations of our DLW test artifact. The difference between two slicers, Cura and 3DPoli, and the implications on measured feature sizes and the general shape is quantified. The measured geometries are used to derive a general design guide for a specific combination of photoresist, laser power and scanning speed and to analyse the geometric accuracy of a structure produced using these guidelines.
Filigree structures can be manufactured via two-photon-polymerization (2PP) operating in the regime of non-linear light absorption. For the first time it is possible to apply this technique to the powder processing of ceramic structures with a feature size in the range of the critical defect size responsible for brittle fracture and, thus, affecting fracture toughness of high-performance ceramics. In this way, tailoring of advanced properties can be achieved already in the shaping process. Traditionally, 2PP relies on transparent polymerizable resins, which is diametrically opposed to the usually completely opaque ceramic resins and slurries. Here we present a transparent and photocurable suspension of nanoparticles (resin) with very high mass fractions of yttria-stabilized zirconia particles (YSZ). Due to the extremely well dispersed nanoparticles, scattering of light can be effectively suppressed at the process-relevant wavelength of 800 nm. Sintered ceramic structures with a resolution of down to 500 nm were obtained. Even at reduced densities of 1 to 4 g/cm³, the resulting compressive strength with 4,5 GPa is equivalent or even exceeding bulk monolithic yttria stabilized zirconia. A ceramic metamaterial is born, where the mechanical properties of yttria stabilized zirconia are altered by changing geometrical parameters and gives access to a new class of ceramic materials.
Mussel-inspired polydopamine (PDA) initiated a multifunctional modification route that leads to the generation of novel advanced materials and their applications. However, existing PDA deposition techniques still exhibit poor spatial control, have a very limited capability of micropatterning and do not allow to locally tune PDA topography. Herein, we demonstrate PDA deposition based on Multiphoton Lithography (MPL) that enables full spatial and temporal control with nearly total freedom of patterning design. Using MPL, we achieve 2D microstructures of complex design with pattern precision of 0.8 μm without the need of a photomask or stamp. Moreover, this approach permits adjusting the morphology and thickness of the fabricated microstructure within one deposition step, resulting in a unique tunability of materials properties. The chemical composition of PDA is confirmed and its ability for protein enzyme immobilization is demonstrated. This work presents a new methodology for high precision and complete control of PDA deposition, enabling PDA incorporation in applications where fine and precise local surface functionalization is required. Possible applications include multicomponent functional elements and devices in microfluidics or lab-on-a-chip systems.