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- AFM (1)
- Ellipsometry (1)
- FTIR (1)
- Gasfluorierung (1)
- IR (1)
- NF2-Gruppe (1)
- PACVD (1)
- Profilometry (1)
- SEM (1)
- Silicon oxide (1)
Bulk samples and thin films of polyamides (PA6 and PA12) were exposed to fluorine (1 - 10 vol.-% F2 in N2) and analysed with photoelectron (XPS) and infrared spectroscopy. Fluorination affects both, the amide and the hydrocarbon parts of the polymers. However, only the carbon atom next to the carbonyl is readily fluorinated. Chemical modification of the amide group is apparent in a large binding energy shift (+5 eV) of the N1s level and the appearance of a CO band at 1734 cm-1. It is concluded that the amide C-N bond is cleaved in the fluorination process and that COOH and NF2 end groups are formed. This conclusion is corroborated by the appearance of ester oxygen in the XPS and by the 19F NMR spectra of the volatile products that show fluorine signals chemically shifted about 200 ppm towards lower field as compared with the CHF environment.
In this paper the preparation of silicon and titanium oxide thin films using an atmospheric pressure plasma process will be reported. To obtain these oxide films hexamethyldisiloxane and titanium tetraisopropoxide were used as precursor materials. Based on the different chemical reaction mechanisms the film deposition processes were carried out in the direct as well as in the remote PACVD mode. The deposition parameters were varied and the influence on different film properties was studied. The deposited oxide films were characterised by profilometry, ellipsometry, SEM, UV-VIS-NIR-transmission measurements. FT-IR spectroscopy and contact angle measurements. Additionally, first results will be presented concerning the creation of composite films using a combination of plasma and liquid dye nebulization technique.