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Titanium and its alloys are known to allow the straightforward laser-based manufacturing of ordered surface nanostructures, so-called high spatial frequency laser-induced periodic surface structures (HSFL). These structures exhibit sub-100 nm spatial periods – far below the optical diffraction limit. The resulting surface functionalities are usually enabled by both, topographic and chemical alterations of the nanostructured surfaces. For exploring these effects, multi-method characterizations were performed here for HSFL processed on Ti–6Al–4V alloy upon irradiation with near-infrared ps-laser pulses (1030 nm, ≈1 ps pulse duration, 1–400 kHz) under different laser scan processing conditions, i.e., by systematically varying the pulse repetition frequency and the number of laser irradiation passes. The sample characterization involved morphological and topographical investigations by scanning electron microscopy (SEM), atomic force microscopy (AFM), tactile stylus profilometry, as well as near-surface chemical analyses hard X-ray photoelectron spectroscopy (HAXPES) and depth-profiling time-of-flight secondary ion mass spectrometry (ToF-SIMS). This provides a quantification of the laser ablation depth, the geometrical HSFL characteristics and enables new insights into the depth extent and the nature of the non-ablative laser-induced near-surface oxidation accompanying these nanostructures. This allows to answer the questions how the processing of HSFL can be industrially scaled up, and whether the latter is limited by heat-accumulation effects.
Laser-induced periodic surface structures (LIPSS) have gained remarkable attention as they represent a universal phenomenon that is often accompanying laser-processing. Such LIPSS enable a large variety of different surface functionalizations for applications in the fields of optics, fluidics, tribology, or medicine. Moreover, so-called “high spatial frequency LIPSS” (HSFL) provide an appealing and straightforward way for surface nanostructuring featuring spatial periods even below 100 nm – far beyond the optical diffraction limit. However, the imposed surface functionalities are usually caused by both, topographic and chemical surface alterations. For exploring these effects in detail, multi-method characterizations were performed here for HSFL on processed Ti- 6Al- 4V alloy upon irradiation with near-infrared ps-laser pulses (1030 nm wavelength, ~1 ps pulse duration, 1 – 400 kHz pulse repetition rate) under different laser and scan processing conditions. The sample characterization involved morphological and topographical investigations by scanning electron microscopy (SEM), atomic force microscopy (AFM), stylus profilometry (SP), and white light interference microscopy (WLIM), as well as near-surface chemical analyses by X-ray photoelectron spectroscopy (XPS), hard X-ray photoelectron spectroscopy (HAXPES) and depth-profiling time-of-flight secondary ion mass spectrometry (TOF-SIMS). The results allow to qualify the laser ablation depth, the geometrical HSFL characteristics and provide detailed insights into the depth extent and the nature of the ps-laser-induced near-surface oxidation. Significance for medical applications will be outlined.
Laser-induced periodic surface structures (LIPSS) and their combination with self-ordered microstructures forming hierarchical Spikes enable a large variety of different surface functionalizations for applications in the fields of optics, fluidics, tribology, or medicine. Moreover, high spatial frequency LIPSS (HSFL) provide an appealing and straightforward way for surface nanostructuring featuring spatial periods even below 100 nm – far beyond the optical diffraction limit. However, the imposed surface functionalities are usually caused by both, topographic and chemical surface alterations. For exploring these effects in detail, multi-method characterizations were performed here for HSFL and hierarchical Spikes processed on Ti-6Al-4V alloy upon irradiation with near-infrared ps-laser pulses (1030 nm wavelength, ~1 ps pulse duration, 1 – 400 kHz pulse repetition rate) under different laser and scan processing conditions. The following sample characterization involved morphological and topographical investigations by scanning electron microscopy (SEM), atomic force microscopy (AFM), stylus profilometry (SP), and white light interference microscopy (WLIM), as well as near-surface chemical analyses by X-ray photoelectron spectroscopy (XPS), hard X-ray photoelectron spectroscopy (HAXPES) and depth-profiling time-of-flight secondary ion mass spectrometry (TOF-SIMS). The results allow to qualify the laser ablation depth, the geometrical HSFL/Spikes characteristics and provide detailed insights into the depth extent and the nature of the ps-laser-induced near-surface oxidation arising from the laser-processing in ambient air and into the relevance of heat-accumulation effects at high pulse repetition rates. Moreover, the direct comparison of the HAXPES and XPS data reveals the role of surface-covering organic contaminants adsorbed from the ambient atmosphere without the uncertainties and potential sputter reduction potentially caused by ion-sputter depth profiling.