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Towards an industrial laser doping process for the selective emitter using phosphoric acid as dopant
(2011)
Different laser supported approaches have already been realized, proving the great potential of laserdoped selective emitters (LDSE). However, it is challenging to establish a low-cost process by using pulsed laser tools. So far a single-step process only leads to satisfying results utilizing cw-lasers. In this paper we have examined a two-step process to produce laser-doped selective emitters on multicrystalline textured standard silicon photovoltaic wafers (90-Ω/sq-Emitter, SiN-antireflection coating (ARC)). The precise ARC removal by near-infrared fs-laser pulses (30 fs, 800 nm), and the doping of uncoated silicon wafers by ns-laser pulses (8 ns, 532 nm) were systematically investigated. In the fs-experiment, optimum conditions for ARC removal were identified. In the nsexperiments under suitable conditions (melting regime), the phosphorous concentration underneath the wafer surface was significantly increased and the sheet resistance was reduced by nearly a factor of two. Moreover, electrical measurements on fired metallization fingers deposited on the laser processed wafers showed low contact resistances. Hence, wafer conditioning with combined fs-laser- and ns-laser-processes are expected to be a promising technology for producing selective emitters.
Ultrashort pulses lasers are tools of choice for functionalizing the bulk of transparent materials. In particular, direct photoinscription of simple photonic functions have been demonstrated. Those elementary functions rely on the local refractive index change induced when focusing an ultrashort pulse in the volume of a transparent material. The range of possibilities offered by direct photoinscription is still under investigation. To help understanding, optimizing and assessing the full potential of this method, we developed a time-resolved phase contrast microscopy setup. The imaginary part (absorption) and the real part of the laser-induced complex refractive index can be visualized in the irradiated region. The setup is based on a commercially available phase contrast microscope extended into a pump-probe scheme. The originality of our approach is that the illumination is performed by using a pulsed laser source (i.e. a probe beam). Speckle-related issues are solved by employing adequate sets of diffusers. This laser-microscopy technique has a spatial resolution of 650 nm, and the impulse response is about 300 fs. The laser-induced refractive index changes can be tracked up to milliseconds after the energy deposition. The excitation beam (the pump) is focused with a microscope objective (numerical aperture of 0.45) into the bulk of an a-SiO2 sample. The pump beam can be temporally shaped with a SLM-based pulse shaping unit. This additional degree of flexibility allows for observing different interaction regimes. For instance, bulk material processing with femtosecond and picosecond duration pulses will be studied.
Laser-induced periodic surface structures (LIPSS) are a universal phenomenon that is accompanying laser materials processing. These surface nanostructures pave a simple way for surface functionalization with numerous applications in optics, fluidics, tribology, medicine, etc. This contribution reviews the current view on the role of electromagnetic scattering in the formation of LIPSS.
The role of electromagnetic scattering in the formation of laser-induced periodic surface structures
(2021)
Laser-induced periodic surface structures (LIPSS) are a universal phenomenon that is accompanying laser materials processing. These surface nanostructures pave a simple way for surface functionalization with numerous applications in optics, fluidics, tribology, medicine, etc. During the last decade remarkable experimental and theoretical improvements in understanding of their formation mechanisms were obtained - all pointing toward polarization-dependent energy deposition by absorption of optical radiation that is scattered at the surface roughness and interfering with the laser beam. This contribution reviews the current state-of-the-art on the role of electromagnetic scattering in the formation of LIPSS by ultrashort laser pulses. Special attention is drawn to recent finite-difference time-domain (FDTD) calculations that allow to visualize the radiation patterns formed in the vicinity of the sample surface and to the impact of a thin superficial laser-induced oxidation layer.
Different types of laser-generated surface structures, i.e., Laser-induced Periodic Surface Structures (LIPSS, ripples), Grooves, and Spikes are generated on titanium and Ti6Al4V surfaces by means of femtosecond (fs) laser scan processing (790 nm, 30 fs, 1 kHz) in ambient air. Morphological, chemical and structural properties of the different surface structures are characterized by various surface analytical techniques, including scanning electron microscopy (SEM), X-ray diffraction (XRD), Glow discharge optical emission spectroscopy (GD-OES), and depth-profiling Auger electron spectroscopy (AES). It is revealed that the formation of near-wavelength sized LIPSS is accompanied by the formation of a graded oxide extending several tens to a few hundreds of nanometers into depth. GD-OES performed on other superficial fs-laser generated structures produced at higher fluences and effective number of pulses per spot area such as periodic Grooves and irregular Spikes indicate even thicker graded oxide layers. These graded layers may be suitable for applications in prosthetics or tribology.