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For the first time, an ab initio calibration for absolute Mg isotope ratios was carried out, without making any a priori assumptions. All quantities influencing the calibration such as the purity of the enriched isotopes or liquid and solid densities were carefully analysed and their associated uncertainties were considered. A second unique aspect was the preparation of three sets of calibration solutions, which were applied to calibrate three multicollector ICPMS instruments by quantifying the correction factors for instrumental mass discrimination. Those fully calibrated mass spectrometers were then used to determine the absolute Mg isotope ratios in three candidate European Reference Materials (ERM)-AE143, -AE144 and -AE145, with ERM-AE143 becoming the new primary isotopic reference material for absolute isotope ratio and delta measurements. The isotope amount ratios of ERM-AE143 are n(25Mg)/n(24Mg) = 0.126590(20) mol/mol and n(26Mg)/n(24Mg) = 0.139362(43) mol/mol, with the resulting isotope amount fractions of x(24Mg) = 0.789920(46) mol/mol, x(25Mg) = 0.099996(14) mol/ mol and x(26Mg) = 0.110085(28) mol/mol and an atomic weight of Ar(Mg) = 24.305017(73); all uncertainties were stated for k = 2. This isotopic composition is identical within uncertainties to those stated on the NIST SRM 980 certificate. The candidate materials ERM-AE144 and -AE145 are isotopically lighter than ERM-AE143 by 1.6 ‰ and 1.3 ‰, respectively, concerning their n(26Mg)/n(24Mg) ratio. The relative combined standard uncertainties are ≤0.1 ‰ for the isotope ratio n(25Mg)/n(24Mg) and ≤0.15 ‰ for the isotope ratio n(26Mg)/ n(24Mg). In addition to characterizing the new isotopic reference materials, it was demonstrated that commonly used fractionation laws are invalid for correcting Mg isotope ratios in multicollector ICPMS as they result in a bias which is not covered by its associated uncertainty. Depending on their type, fractionation laws create a bias up to several per mil, with the exponential law showing the smallest bias between 0.1 ‰ and 0.7 ‰.
The preparation and characterization of poly(ionic liquid)s (PILs) bearing a polystyrene backbone via reversible addition fragmentation chain transfer (RAFT) polymerization and their photolithographic patterning on silicon wafers is reported. The controlled radical polymerization of the styrenic ionic liquid (IL) monomers ([BVBIM]X, X = Cl− or Tf2N−) by RAFT polymerization is investigated in detail. We provide a general synthetic tool to access this class of PILs with controlled molecular weight and relatively narrow molecular weight distribution (2000 g mol−1 ≤ Mn ≤ 10 000 g mol−1 with dispersities between 1.4 and 1.3 for p([BVBIM]Cl); 2100 g mol−1 ≤ MP ≤ 14 000 g mol−1 for p([BVBIM]Tf2N)). More importantly, we provide an in-depth characterization of the PILs and demonstrate a detailed mass spectrometric analysis via matrix-assisted laser desorption ionization (MALDI) as well as – for the first time for PILs – electrospray ionization mass spectrometry (ESI-MS). Importantly, p([BVBIM]Cl) and p([DMVBIM]Tf2N) were photochemically patterned on silicon wafers. Therefore, a RAFT agent carrying a photoactive group based on ortho-quinodimethane chemistry – more precisely photoenol chemistry – was photochemically linked for subsequent controlled radical polymerization of [BVBIM]Cl and [DMVBIM]Tf2N. The successful spatially-resolved photografting is evidenced by surface-sensitive characterization methods such as X-ray photoelectron spectroscopy (XPS) and time-of-flight secondary ion mass spectrometry (ToF-SIMS). The presented method allows for the functionalization of diverse surfaces with poly(ionic liquid)s.