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A combination of nanosized dielectric relaxation (BDS) and thermal spectroscopy (SHS) was utilized to characterize the dynamics of thin films of Poly(vinyl methyl ether) (PVME) (thicknesses: 7 nm – 160 nm). For the BDS measurements, a recently designed nano-structured electrode system is employed. A thin film is spin-coated on an ultra-flat highly conductive silicon wafer serving as the bottom electrode. As top electrode, a highly conductive wafer with non-conducting nanostructured SiO2 nano-spacers with heights of 35 nm or 70 nm is assembled on the bottom electrode. This procedure results in thin supported films with a free polymer/air interface. The BDS measurements show two relaxation processes, which are analyzed unambiguously for thicknesses smaller than 50 nm. The relaxation rates of both processes have different temperature dependencies. One process coincidences in its position and temperature dependence with the glassy dynamics of bulk PVME and is ascribed to the dynamic glass transition of a bulk-like layer in the middle of the film. The relaxation rates were found to be thickness independent as confirmed by SHS. Unexpectedly, the relaxation rates of the second process obey an Arrhenius-like temperature dependence. This process was not observed by SHS and was related to the constrained fluctuations in a layer, which is irreversibly adsorbed at the substrate with a heterogeneous structure. Its molecular fluctuations undergo a confinement effect resulting in the localization of the segmental dynamics. To our knowledge, this is the first report on the molecular dynamics of an adsorbed layer in thin films.
For many years now, the so-called three layer model (free-surface, bulk-like, and adsorbed layers) has been commonly used, along with other parameters, to explain the deviations seen in glass transition and glassy dynamics for polymers confined into thin films, compared to their bulk value. Nevertheless, due to the hard accessibility of the adsorbed layers in supported films, little is known about the nature of their dynamics and how they really influences the overall dynamics of the thin films. Here, the irreversibly self-assembled adsorbed layer of a low MW Poly (vinyl methyl ether) (PVME) is solvent-leached from a 200 nm film. The thickness and topography of this layer is checked with Atomic Force Microscopy (AFM), to insure no dewetting and low roughness. Further, the dynamics of the adsorbed layer is then in-situ probed with Broadband Dielectric Spectroscopy (BDS). A recently developed nano-structured capacitor arrangement was employed; where a silicon wafer with nanostructured SiO2 nano-spacers, with heights of 35 nm, is placed on top of a thin film spin coated on an ultra-flat highly conductive silicon wafer. All results will be discussed in detail and quantitatively compared to our recent work on the glassy dynamics of PVME thin films (50 nm- 7nm), where BDS measurements showed two thickness-independent relaxation processes. The first process was assigned to the -relaxation of a bulk-like layer. Whereas the second process showed a different temperature dependence and was ascribed to the relaxation of polymer segments adsorbed at the substrate. To our knowledge, this is the first in-situ study of the dynamics of an irreversibly adsorbed layer.
Anomalous surface composition in thin films of a poly(vinyl methyl ether) / polystyrene blend
(2017)
Highly surface-sensitive X-ray photoelectron spectroscopy at HE-SGM beamline revealed in the outermost region (< 2nm) of thin films (15 -65 nm) of PVME/PS blends a relative high amount of PS, whereas in slightly deeper regions PVME was enriched. Such enrichment of PVME in the whole near-surface region was proposed in former investigations based on conventional XPS studies.
Loss in efficiency of perovskite solar cells may be caused by structural and/or chemical alterations of the complex layered system. As these changes might take place either in the bulk and/or on the surface of the stratified material, analytical tools addressing both key issues are selected and combined. SEM/EDX combined with XPS were chosen as appropriate methodical approach to characterise perovskite laboratory cells in depth and complementary on top, before and after light exposure. The layered perovskite system investigated here is based on glass covered with fluorine doped tin oxide (FTO), followed by three porous thin films of TiO2, ZrO2 and a thick monolithic carbon. The TiO2 film is subdivided into a dense layer covered by a porous one constituted of nanoparticles with a truncated bipyramidal shape. This layered system serves as the matrix for the perovskite. After infiltration of perovskite solution and annealing, EDX
spectral maps on cross-sections of the specimen have been measured. The distribution of relevant
elements – Si, Sn, Ti, Zr and C – correlates conclusively with layers visible in the acquired SEM images. Lead and iodine are distributed throughout the porous layers C, ZrO2 and TiO2. In a SEM micrograph taken of the cross-section of a sample after illumination, the glass substrate and all layers FTO, TiO2, ZrO2 as well as C are clearly identified. By EDX it was found that several weeks of ambient daylight did not change significantly the qualitative elemental composition of lead and iodine throughout the solar cell system. It was confirmed with EDX that nanoparticles identified in high-resolution SEM micrographs contain mainly Pb and I, indicating these to be the perovskite
crystals. However, a time-dependent compositional and chemical altering was observed with XPS for the near-surface region of the outermost ~10 nm after two months of illumination.
Industrial quality control (QC) nowadays requires the visualization of surface modifications from the macro-scopic to the microscopic or even nanoscopic scale. This is a prerequisite to the evaluation of functionality and reliability, the detection of defects and their separation of artefacts. The diversity of applications ranges from low-E glazings and solar panels, micro- and optoelectronics, micro- and smart devices to sensor-on-chip and lab-on-chip systems [1]. Optical microcopy (light, confocal laser scanning, white light interference) as established QC-tool is operated at normal incidence, i.e. p- and s-polarization are undistinguishable. Either light-intensity in terms of grey scale and colour or intensity-correlated effects of phase shifts are used. In case of ellipsometry, operated at oblique incidence, p- and s-polarization matter, and amplitude ratios and phase shifts upon reflection are measured. Hence, information content must be much higher.
The visualization of surface modifications may be very challenging for coating/substrate systems of either al-most identical optical constants, e.g. transparent films on substrates of the same material, or minor film thick-ness, substance quantity and affected area, e.g. ultra-thin or island films. Ellipsometry gives access to the con-trast of intensity (I), amplitude ratio (Ψ), and phase shift (Δ) with nanometer-scaled vertical and micrometer-scaled lateral sensitivity, one is able to identify tiny changes within an unmodified surface. As both mapping ellipsometry (ME) and imaging ellipsometry (IE) are operated in the optical far-field, surface inspection is also possible on the macroscopic scale. Near the Brewster-angle of the bare, undamaged, clean, and fresh substrate, the contrast to add-on and sub-off features is superior.
Fig. 1 shows three examples of ellipsometric imaging, i.e. a thin SnO:Ni film on SiO2/Si (Fig. 1a), a dried stain of an anti-body solution on cyclo-olefin-polymer (COP) shown in Fig. 1b, and a polyimide film residue on SiO2/Si (Fig. 1c). For all of these examples, ellipsometry provides much better contrast between substrate and surface modification than optical microscopy, sometimes primarily caused by the oblique incidence (Figs. 1a and 1c), in other cases related to the phase sensitivity of ellipsometry (Fig. 1b). Other examples are laser surface modifications and the corrosion of glass. In these cases, optical microscopy and IE yield to similar results, how-ever only ellipsometry gives access to modelling.
Further investigated coating/substrate systems are 100Cr6 steel, native oxide on silicon, borosilicate glass, and the polymer polycarbonate with deposited films of graphene and ta-C:H, printed and dried pattern of liquids such as water, cleaning agents, and dissolved silicone. Besides imaging ellipsometry, referenced spectral ellipsometry (RSE) has been applied, combining the advantages of both optical microscopy (fast measurement) and ellipsometry (high sensitivity to tiny modifications).
Scanning Electron Microscopy (SEM) represents the mostly widespread method available in analytical laboratories dedicated to the characterization of physical properties such as morphology of various solid materials from ‘micro-’ down to the nanometre scale. The use of secondary electrons excited by a sharply, nm-focussed primary electron beam enables at any modern SEM to image objects with high in-depth and lateral sensitivity, i.e. with high spatial resolution. Hence, e. g. nanoparticles (NPs) are able to be easily characterized with respect to their individual size and shape, but also to the morphology of their surface.
By preparing the nano-objects on thin membranes as electron transparent samples it is possible to perform electron microscopy in the transmission mode (TEM and TSEM). The corresponding transmission (i.e. mass-thickness) contrast reveals in-depth information, but is also well suited for dimensional measurements in the 2D projection image. Both the surface sensitive mode and the transmission one are meanwhile available at any modern SEM. If an X-ray spectrometer is attached to an electron microscope, it is possible to analyse the characteristic X-rays induced by electron bombardment. Most electron microscopes have attached an energy dispersive X-ray spectrometer (EDX) so that EDX elemental maps can be carried out. Recent technological developments of high throughput EDS detectors and their advantages regarding high-resolution X-ray analysis down to the nm range are reviewed.
High-resolution micrographs (SEM, TSEM, TEM) and corresponding X-ray elemental maps on various representative nanoparticles, but also layered samples prepared in cross-section, will be presented and discussed. The importance of selecting the best suited analysis conditions will be highlighted. Also other, often challenging, topics such as sample preparation and image data processing will be critically addressed by practical examples. Further analytical techniques able to be employed at an electron microscope, like cathodoluminescence (CL) or micro-X-ray fluorescence (µXRF) will be briefly surveyed.
Maintaining a consistent product quality is critical for the thin film industry. Therefore, the development of highly accurate protocols able to detect variations and nonidealities in manufactured thin film devices is essential and helps improve production quality and decrease manufacturing costs. The present work will discuss the accuracy and reproducibility in the determination of the thickness of thin films relevant for optoelectronic industry using spectroscopic ellipsometry, starting with the importance of set-up calibration, the need for very well defined calibration standards suitable for real devices and not least, the importance of accurate data analysis. As ellipsometry is an indirect method and theoretical modelling is needed to obtain the desired information regarding the investigated samples (e.g. thickness, roughness, optical constants), the model uncertainty has to be discussed and taken into account. If for ideal samples consisting of single layers with well-known optical constants the determination of thickness and roughness is straight forward and pretty accurate, for real samples, more complex theoretical models are needed and extracting accurate information regarding the samples can be very challenging. With careful calibration and a multidisciplinary approach, a combined measurement methodology can be developed enabling reliability, comparability, and accuracy. For production-relevant operation, maintaining the ease of use and scalability of ellipsometry as a technique can also be retained.
The physico-chemical characteristics of TiO2 coatings can greatly influence their final performance. In SETNanoMetro, different deposition procedures are being set for applying films of TiO2 NPs with defined and homogenous thickness on supports of interest for the applications studied in the project. The selected substrates are the following: (i) Silica glasses for photocatalytic measurements, (ii) Ti-alloys for orthopedic and/or dental prostheses, and for cell cultures, and (iii) Conductive glasses (e.g. Fluorine doped Tin Oxide, FTO) for dye-sensitized solar cells. From the different film deposition procedures studied within the project Self-assembly of TiO2 NPs in multiple layers was selected. For this, surface modification of the substrate and of TiO2 nanoparticles (NPs) with e.g. silane coupling agents is a prerequisite. First attempts to prepare the self-assembled coating on the functionalized glass substrates seem to indicate that the functionalized NPs adhere to the substrates, even if the final coatings were not homogenous and presented agglomerates. ToF-SIMS results support this outcome.
In order to use the layer-by-layer deposition technique for the formation of TiO2 films by controlled self-assembly of the TiO2 NPs, the proper complementary moieties for the functionalization of the NPs were chosen. A first set of NPs has been produced by reaction with (3-aminopropyl)phosphonic acid (APPA) in order to functionalize the surface with free amino-groups. Then, the complementary NP set can be obtained from an aliquot of the first one, through the conversion of free surface amino-groups to aldehydes by reaction with glutaraldehyde. A proper approach for the functionalization of two types of TiO2, commercial P25 (Evonik) and SETNanoMetro-sample labelled UT001, with APPA was developed. A second set of NPs consisting of three types of TiO2 NPs, P25 and SETNanoMetro NPs (TiO2 NPs with high specific surface area > 150 m2/g and TiO2 NPs with low size < 20 nm) was functionalized with (3-aminopropyl)triethoxysilane (APTS). As for the previous set of NPs, the complementary NP set was obtained through the conversion of free surface amino-groups to aldehydes by reaction with glutaraldehyde. EDX, AES and ToF-SIMS spectra were collected and analyzed to demonstrate the presence of the surface functionalization of the different types of TiO2 NPs.
This talk presents multi-wavelength, multi-material prediction tools serving as useful models for researchers working in the field of laser-induced periodic surface structures (LIPSS). These models explain the role of surface plasmon polaritons (SPPs) in the formation of LIPSS. They particularly consider the cases of (i) “lossy” materials (where the imaginary part of the dielectric permittivity should not be neglected) and (ii) the excitation of SPPs in a thin film configuration (where two film interfaces become plasmonically active and couple to each other).
Visualization of surface modifications may be very challenging for coating/substrate systems of either almost identical optical constants, e.g. transparent films on substrates of the same material, or minor film thickness, substance quantity and affected area, e.g. ultra-thin or island films. Methods for visualization are optical microscopy (OM), imaging ellipsometry (IE), and referenced spectroscopic ellipsometry (RSE). Imaging ellipsometry operates at oblique incidence near Brewster angle of the bare, clean or unmodified substrate. In this configuration, reflected intensities are rather weak. However, the contrast to add-on and sub-off features may be superior. Referenced spectroscopic ellipsometry operates in a two-sample configuration but with much higher intensities. In many cases, both ellipsometric techniques reveal and visualize thin films, printed-pattern, laser-induced changes, and impurities better than optical microscopy. In particular for stratified homogeneous modifications, ellipsometric techniques give access to modelling and hence thickness determination. Modifications under investigation are polymer foil residue on silicon, laser-induced changes of ta-C:H coatings on 100Cr6 steel, imperfections of ta-C:H on thermal silicon oxide, degradation of glass, thin film tin oxide pattern on silicon, printed and dried pattern of liquids such as deionized water, cleaning agents, and dissolved silicone. © 2016 Elsevier B.V. All rights reserved.