• Treffer 2 von 8
Zurück zur Trefferliste

Chemical and elemental depth profiling of very thin organic layers by constant kinetic energy XPS: a new synchrotron XPS analysis strategy

  • We present a new synchrotron X-ray photoelectron spectroscopy strategy for surface chemical analysis of materials. Our approach is based on the acquisition of photoelectron spectra at constant kinetic energies with the help of a tunable synchrotron X-radiation source. This ensures both constant and tunable information depth for all elements in a very thin organic layer. Many of the problems known to XPS depth profiling using laboratory equipment are thereby avoided. Using our methodology, the 95% information depth, z95%, can be tuned down to about 0.7 nm in organic materials. The upper limit in our study at the HE-SGM monochromator dipole magnet beamline at the synchrotron radiation source BESSY II is about 4.3 nm. Elemental quantification is achieved through relative sensitivity factors (RSF) specific to the measurement conditions, determined either with the help of calculated photoionization cross sections and inelastic mean free paths or experimentally. The potential of theWe present a new synchrotron X-ray photoelectron spectroscopy strategy for surface chemical analysis of materials. Our approach is based on the acquisition of photoelectron spectra at constant kinetic energies with the help of a tunable synchrotron X-radiation source. This ensures both constant and tunable information depth for all elements in a very thin organic layer. Many of the problems known to XPS depth profiling using laboratory equipment are thereby avoided. Using our methodology, the 95% information depth, z95%, can be tuned down to about 0.7 nm in organic materials. The upper limit in our study at the HE-SGM monochromator dipole magnet beamline at the synchrotron radiation source BESSY II is about 4.3 nm. Elemental quantification is achieved through relative sensitivity factors (RSF) specific to the measurement conditions, determined either with the help of calculated photoionization cross sections and inelastic mean free paths or experimentally. The potential of the technique is demonstrated for the in-depth analysis of plasma deposited nitrogen-rich organic thin films used in biomedical applications.zeige mehrzeige weniger

Metadaten exportieren

Weitere Dienste

Teilen auf Twitter Suche bei Google Scholar Anzahl der Zugriffe auf dieses Dokument
Metadaten
Autor*innen:Pierre-Luc Girard-Lauriault, Thomas Gross, Andreas Lippitz, Wolfgang UngerORCiD
Dokumenttyp:Zeitschriftenartikel
Veröffentlichungsform:Verlagsliteratur
Sprache:Englisch
Titel des übergeordneten Werkes (Englisch):Analytical chemistry
Jahr der Erstveröffentlichung:2012
Verlag:American Chemical Society
Verlagsort:Washington, DC
Jahrgang/Band:84
Ausgabe/Heft:14
Erste Seite:5984
Letzte Seite:5991
DOI:10.1021/ac300585q
ISSN:0003-2700
ISSN:1520-6882
Verfügbarkeit des Dokuments:Physisches Exemplar in der Bibliothek der BAM vorhanden ("Hardcopy Access")
Bibliotheksstandort:Sonderstandort: Publica-Schrank
Datum der Freischaltung:19.02.2016
Referierte Publikation:Ja
Datum der Eintragung als referierte Publikation:13.08.2012
Einverstanden
Diese Webseite verwendet technisch erforderliche Session-Cookies. Durch die weitere Nutzung der Webseite stimmen Sie diesem zu. Unsere Datenschutzerklärung finden Sie hier.