Electrical Properties of Carbon Black and Ruthenium Dioxide Embedded Silica Films
- The electrical properties of solgel-derived films can be tailored by embedding conductive particles of ruthenium dioxide or carbon black in an insulating amorphous SiO2 silica matrix. The preparation process included an acid hydrolysis of tetraethoxysilane and methyltrimethoxysilane. Then alcohol solutions of ruthenium chloride or carbon black were added. Films of filler concentration up to 60 vol.% were prepared by dip coating and then dried and heat-treated at various temperatures up to 600_°C. The D.C. resistance of the films can be varied within the range of 109 to 102 OHgr sdot cm. A non-linear dependence on filler composition in the films was observed for both systems, which is explained by a modified percolation theory. A percolation threshold of 5.5 vol.% for SiO2-RuO2 or 50 vol.% for SiO2-C films, whereby the resistance drastically decreases, was determined. Moreover the temperature dependency of resistance and the current-voltage characteristics of the films can also beThe electrical properties of solgel-derived films can be tailored by embedding conductive particles of ruthenium dioxide or carbon black in an insulating amorphous SiO2 silica matrix. The preparation process included an acid hydrolysis of tetraethoxysilane and methyltrimethoxysilane. Then alcohol solutions of ruthenium chloride or carbon black were added. Films of filler concentration up to 60 vol.% were prepared by dip coating and then dried and heat-treated at various temperatures up to 600_°C. The D.C. resistance of the films can be varied within the range of 109 to 102 OHgr sdot cm. A non-linear dependence on filler composition in the films was observed for both systems, which is explained by a modified percolation theory. A percolation threshold of 5.5 vol.% for SiO2-RuO2 or 50 vol.% for SiO2-C films, whereby the resistance drastically decreases, was determined. Moreover the temperature dependency of resistance and the current-voltage characteristics of the films can also be explained by this geometric model.…
MetadatenAutor*innen: | Thomas Hübert, Aki Shimamura, Andreas Klyszcz |
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Dokumenttyp: | Zeitschriftenartikel |
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Veröffentlichungsform: | Verlagsliteratur |
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Sprache: | Englisch |
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Titel des übergeordneten Werkes (Englisch): | Journal of sol gel science and technology |
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Jahr der Erstveröffentlichung: | 2004 |
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Verlag: | Kluwer Academic Publ. |
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Verlagsort: | Dordrecht |
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Jahrgang/Band: | 32 |
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Erste Seite: | 131 |
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Letzte Seite: | 135 |
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Freie Schlagwörter: | Carbon black; Percolation phenomena; Ruthenium dioxide; Sol-gel; Thin films |
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DOI: | 10.1007/s10971-004-5777-5 |
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ISSN: | 0928-0707 |
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ISSN: | 1573-4846 |
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Verfügbarkeit des Dokuments: | Physisches Exemplar in der Bibliothek der BAM vorhanden ("Hardcopy Access") |
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Bibliotheksstandort: | Sonderstandort: Publica-Schrank |
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Datum der Freischaltung: | 19.02.2016 |
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Referierte Publikation: | Ja |
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Datum der Eintragung als referierte Publikation: | 14.02.2005 |
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