The search result changed since you submitted your search request. Documents might be displayed in a different sort order.
  • search hit 11 of 164
Back to Result List

Tunable contact angle hysteresis on compliant magnetoactive elastomers

  • It is shown that the advancing (ACA) and receding (RCA) contact angles of water on extremely soft (shear modulus of the order of 10 kPa) magnetoactive elastomer (MAE) films significantly depend on the applied magnetic field. The difference between these angles, known as the contact angle hysteresis, is examined. The roles of the filler concentration and material softness are elaborated. The highest change in the contact angle hysteresis (CAH) from 34° in the absence of magnetic field to 76° in a magnetic field of 0.4 T is achieved for the softest sample with the lowest mass fraction of iron particles (70 wt%). The dependence of the CAH on magnetization history (“magnetic hysteresis”) is observed. This magnetic hysteresis is clearly pronounced for the ACA and has little effect on the RCA. Magnetic field-induced changes of the surface roughness exhibit qualitatively the same hysteresis behavior with regard to the external magnetic field as the ACA. The results are promising for the development of smart surfaces for applications where the dynamic wetting has to be controlled.

Export metadata

Additional Services

Share in Twitter Search Google Scholar Statistics
Metadaten
Author:Raphael KrieglORCiD, Alexander Kovalev, Mikhail Shamonin (Chamonine)ORCiDGND, Stanislav Gorb
DOI:https://doi.org/10.1016/j.eml.2023.102049
ISSN:2352-4316
Parent Title (English):Extreme Mechanics Letters
Publisher:Elsevier
Document Type:Article
Language:English
Year of first Publication:2023
Release Date:2023/08/04
Tag:Contact angle hysteresis; Dynamic wetting; Magnetic hysteresis; Magnetoactive elastomers
Volume:63
Article Number:102049
Institutes:Fakultät Elektro- und Informationstechnik
Fakultät Elektro- und Informationstechnik / Labor Intelligente Materialien und Strukturen
Begutachtungsstatus:peer-reviewed
research focus:Produktion und Systeme
Licence (German):Keine Lizenz - Es gilt das deutsche Urheberrecht: § 53 UrhG