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- Gasfluorierung (2)
- IR (2)
- XPS (2)
- -COOH und NF2-Gruppen (1)
- AFM (1)
- Ellipsometry (1)
- FTIR (1)
- Flame retardancy (1)
- Hexamethyldisiloxane plasma polymer (1)
- NF2-Gruppe (1)
In this paper the preparation of silicon and titanium oxide thin films using an atmospheric pressure plasma process will be reported. To obtain these oxide films hexamethyldisiloxane and titanium tetraisopropoxide were used as precursor materials. Based on the different chemical reaction mechanisms the film deposition processes were carried out in the direct as well as in the remote PACVD mode. The deposition parameters were varied and the influence on different film properties was studied. The deposited oxide films were characterised by profilometry, ellipsometry, SEM, UV-VIS-NIR-transmission measurements. FT-IR spectroscopy and contact angle measurements. Additionally, first results will be presented concerning the creation of composite films using a combination of plasma and liquid dye nebulization technique.
Mixtures of hexamethyldisiloxane (HMDSO) and oxygen have been used for deposition of SiO2-like layers by plasma polymerization under low-pressure conditions onto polyethylene and polystyrene used as basecoat. Water glass was cast onto these 0.5 µm plasma thick siloxane-like layers with a thickness of 5 to 40 µm. The adhesion of these bilayer systems and their flame resistance were tested.
The effect of different plasma parameters such as monomer/gas ratio, pressure and power input into the discharge on the deposition rate and the composition of the formed layers was studied. Characterization and chemical composition of the formed films were performed using infrared, X-ray photoelectron and solid state nuclear magnetic resonance spectroscopy.
Peel strengths of composites were measured and the locus of peel front propagation was detected. Thermal properties of composites were analyzed by thermo-gravimetric analysis. Finally, the fire-retardant properties of thick coated polymers were determined by exposure to flames and the behavior of coatings on the polymers during flaming was observed visually.
Efficient formation of difluoramino (NF2) groups within the polymer matrix upon exposure of polyamides (PA6 and PA12) to elemental fluorine is reported. The reaction was assessed on bulk and thin-film samples by means of RA-FTIR (reflection–absorption FTIR), XPS (X-ray photoelectron spectroscopy), and NMR (nuclear magnetic resonance) techniques. Direct fluorination causes cleavage of the amide C–N bond and concomitant formation of the NF2 chain-end functionalities as evident from an exceptionally large shift (+5 eV) of the N 1s binding energy and an increase of the v(CO) frequency by about 80 cm-1. The structural model is supported by the 19F NMR spectra of volatile reaction products that clearly reveal the presence of the NF2 group.
Thin polyamide-6 films were exposed to fluorine gas and analysed with photoelectron and infrared spectroscopies. Fluorine cleaves the amide CN bond resulting in the formation of the COOH and NF2 terminal groups. This is evident from large shifts in the N1s binding energy (+5 eV) and C=O stretching frequency (~80 cm-1), appearance of ester oxygen in the XPS spectra, as well as by the 19F nmr spectra of volatile products consistent with a terminal NF2 group.
Bulk samples and thin films of polyamides (PA6 and PA12) were exposed to fluorine (1 - 10 vol.-% F2 in N2) and analysed with photoelectron (XPS) and infrared spectroscopy. Fluorination affects both, the amide and the hydrocarbon parts of the polymers. However, only the carbon atom next to the carbonyl is readily fluorinated. Chemical modification of the amide group is apparent in a large binding energy shift (+5 eV) of the N1s level and the appearance of a CO band at 1734 cm-1. It is concluded that the amide C-N bond is cleaved in the fluorination process and that COOH and NF2 end groups are formed. This conclusion is corroborated by the appearance of ester oxygen in the XPS and by the 19F NMR spectra of the volatile products that show fluorine signals chemically shifted about 200 ppm towards lower field as compared with the CHF environment.