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- Magnetron sputtering (2) (remove)
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- FG Metallkunde und Werkstofftechnik (2) (remove)
This article describes hot Cr target magnetron sputtering enhanced by a radio-frequency inductively coupled plasma (RF-ICP) source in an Ar + N2 atmosphere. Optical emission spectroscopy revealed an opportunity to perform magnetron sputtering in an inert (Ar) atmosphere, while the CrNx coating can be deposited on a substrate in a chemically reactive atmosphere formed by the RF-ICP source. High stability and repeatability of deposition process were observed, and the deposition rate of the CrNx coatings increased from 106 to 127 nm/min as N2 flow rate rose. The power of the RF-ICP source and the N2 flow rate can be used to tailor and control deposition conditions. The XRD and WDS measurements showed the effect of deposition conditions on the crystal structure and elemental composition of CrNx coatings. It was found that the change of substrate bias, RF-ICP source power and N2 flow rate result in variation of coating stoichiometry from pure Cr to CrN.
CrNx coatings were deposited at high rates (100–130 nm/min) using hot Cr target magnetron sputtering enhanced by a radio-frequency inductively coupled plasma (RF-ICP) source in an Ar + N2 atmosphere. Besides separation of inert and reactive atmosphere, the RF-ICP source can be an effective tool for ion assistance in case of coating growth and to tailor film parameters. The effects of nitrogen flow rate and substrate bias potential on microstructure and functional properties of the CrNx coatings were investigated. An increase in nitrogen flow rate favored the formation of a looser microstructure of the coatings, while substrate biasing had the opposite effect. The functional properties were strongly dependent on the phase composition of the CrNx coatings. The change in coating microstructure significantly affected hardness, elastic modulus, adhesion, friction coefficients and corrosion resistance. The results indicated that ion assistance can be a key feature for regulating functional properties in the considered type of coating deposition. Cr2N and CrN compound coatings with high hardness (∼20 GPa) and low corrosion current density (icorr ∼ 3–5·10−9 A/cm2) in a 3.5 wt% NaCl solution were obtained by high-rate deposition.