Impact of topographic mask models on scanner matching solutions
Author: | Jacek Tyminski, Jan Pomplun, Stephen P. Renwick |
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Document Type: | In Proceedings |
Parent Title (English): | Proc. SPIE: Optical Microlithography XXVII |
Volume: | 9052 |
First Page: | 905218 |
Year of first publication: | 2014 |
DOI: | https://doi.org/10.1117/12.2045919 |