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Laubis, Christian (6)
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2014
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Computational Nano Optics
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Numerical Mathematics
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The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks
(2007)
Scholze, Frank
;
Laubis, Christian
;
Dersch, Uwe
;
Pomplun, Jan
;
Burger, Sven
;
Schmidt, Frank
Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM-simulation
(2008)
Scholze, Frank
;
Laubis, Christian
;
Ulm, Gerhard
;
Dersch, Uwe
;
Pomplun, Jan
;
Burger, Sven
;
Schmidt, Frank
Metrology of EUV masks by EUV-scatterometry and finite element analysis
(2008)
Pomplun, Jan
;
Burger, Sven
;
Schmidt, Frank
;
Scholze, Frank
;
Laubis, Christian
;
Dersch, Uwe
Finite element analysis of EUV lithography
(2007)
Pomplun, Jan
;
Burger, Sven
;
Schmidt, Frank
;
Scholze, Frank
;
Laubis, Christian
;
Dersch, Uwe
Investigation of 3D Patterns on EUV Masks by Means of Scatterometry and Comparison to Numerical Simulations
(2011)
Burger, Sven
;
Zschiedrich, Lin
;
Pomplun, Jan
;
Schmidt, Frank
;
Kato, Akiko
;
Laubis, Christian
;
Scholze, Frank
Determination of line profiles on photomasks using DUV, EUV and X-ray scattering
(2014)
Scholze, Frank
;
Bodermann, Bernd
;
Burger, Sven
;
Endres, Johannes
;
Haase, Anton
;
Krumrey, Michael
;
Laubis, Christian
;
Soltwisch, Victor
;
Ullrich, Albrecht
;
Wernecke, Jan
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