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Pomplun, Jan (54)
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finite element method
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reduced basis method
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electromagnetic field solver
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optical metrology
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rigorous optical modeling
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adaptive sampling
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maxwell equation
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The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks
(2007)
Scholze, Frank
;
Laubis, Christian
;
Dersch, Uwe
;
Pomplun, Jan
;
Burger, Sven
;
Schmidt, Frank
Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM-simulation
(2008)
Scholze, Frank
;
Laubis, Christian
;
Ulm, Gerhard
;
Dersch, Uwe
;
Pomplun, Jan
;
Burger, Sven
;
Schmidt, Frank
Metrology of EUV masks by EUV-scatterometry and finite element analysis
(2008)
Pomplun, Jan
;
Burger, Sven
;
Schmidt, Frank
;
Scholze, Frank
;
Laubis, Christian
;
Dersch, Uwe
Rigorous FEM-Simulation of EUV-Masks: Influence of shape and material parameters
(2006)
Pomplun, Jan
;
Burger, Sven
;
Schmidt, Frank
;
Zschiedrich, Lin
;
Scholze, Frank
Finite element analysis of EUV lithography
(2007)
Pomplun, Jan
;
Burger, Sven
;
Schmidt, Frank
;
Scholze, Frank
;
Laubis, Christian
;
Dersch, Uwe
Investigation of 3D Patterns on EUV Masks by Means of Scatterometry and Comparison to Numerical Simulations
(2011)
Burger, Sven
;
Zschiedrich, Lin
;
Pomplun, Jan
;
Schmidt, Frank
;
Kato, Akiko
;
Laubis, Christian
;
Scholze, Frank
Finite Element Methods for Computational Nano-optics
(2012)
Burger, Sven
;
Pomplun, Jan
;
Schmidt, Frank
Reduced basis method for source mask optimization
(2010)
Pomplun, Jan
;
Zschiedrich, Lin
;
Burger, Sven
;
Schmidt, Frank
;
Tyminski, Jacek
;
Flagello, Donis
;
Toshiharu, N.
3D Finite-Element Simulations of Enhanced Light Transmission Through Arrays of Holes in Metal Films
(2009)
Burger, Sven
;
Zschiedrich, Lin
;
Pomplun, Jan
;
Schmidt, Frank
;
Kettner, Benjamin
;
Lockau, D.
Finite element method for accurate 3D simulation of plasmonic waveguides
(2010)
Burger, Sven
;
Zschiedrich, Lin
;
Pomplun, Jan
;
Schmidt, Frank
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