Efficient Bayesian inversion for shape reconstruction of lithography masks
Author: | Nando Farchmin, Martin Hammerschmidt, Philipp-Immanuel Schneider, Matthias Wurm, Bernd Bodermann, Markus Bär, Sebastian Heidenreich |
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Document Type: | Article |
Parent Title (English): | J. Micro/Nanolith. MEMS MOEMS |
Volume: | 19 |
First Page: | 024001 |
Year of first publication: | 2020 |
DOI: | https://doi.org/10.1117/1.JMM.19.2.024001 |