Reduced basis method for computational lithography
Author: | Jan Pomplun, Lin Zschiedrich, Sven BurgerORCiD, Frank Schmidt |
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Document Type: | In Proceedings |
Parent Title (English): | Photomask Technology |
Volume: | 7488 |
First Page: | 74882B |
Publisher: | Proc. SPIE |
Year of first publication: | 2009 |
DOI: | https://doi.org/10.1117/12.829639 |