Investigation of 3D Patterns on EUV Masks by Means of Scatterometry and Comparison to Numerical Simulations
Author: | Sven BurgerORCiD, Lin Zschiedrich, Jan Pomplun, Frank Schmidt, Akiko Kato, Christian Laubis, Frank Scholze |
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Document Type: | In Proceedings |
Parent Title (English): | Photomask Technology 2011 |
Volume: | 8166 |
First Page: | 81661Q |
Publisher: | Proc. SPIE |
Year of first publication: | 2011 |
DOI: | https://doi.org/10.1117/12.896839 |