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The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks

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Metadaten
Author:Frank Scholze, Christian Laubis, Uwe Dersch, Jan Pomplun, Sven BurgerORCiD, Frank Schmidt
Editor:Harald Bosse
Document Type:In Proceedings
Parent Title (English):Modeling Aspects in Optical Metrology
Volume:6617
First Page:66171A
Publisher:Proc. SPIE
Year of first publication:2007
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