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Rigorous FEM-Simulation of EUV-Masks: Influence of shape and material parameters

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Metadaten
Author:Jan Pomplun, Sven BurgerORCiD, Frank Schmidt, Lin Zschiedrich, Frank Scholze
Editor:P. Martin, R. Naber
Document Type:In Proceedings
Parent Title (English):Photomask Technology
Volume:6349
First Page:63493D
Publisher:Proc. SPIE
Year of first publication:2006
DOI:https://doi.org/10.1117/12.686828
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