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Metrology of EUV masks by EUV-scatterometry and finite element analysis

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Metadaten
Author:Jan Pomplun, Sven BurgerORCiD, Frank Schmidt, Frank Scholze, Christian Laubis, Uwe Dersch
Editor:Toshiyuki Horiuchi
Document Type:In Proceedings
Parent Title (English):Photomask and Next-Generation Lithography Mask Technology XV
Volume:7028
Publisher:SPIE
Year of first publication:2008
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