Determination of line profiles on photomasks using DUV, EUV and X-ray scattering
Author: | Frank Scholze, Bernd Bodermann, Sven BurgerORCiD, Johannes Endres, Anton Haase, Michael Krumrey, Christian Laubis, Victor Soltwisch, Albrecht Ullrich, Jan Wernecke |
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Document Type: | In Proceedings |
Parent Title (English): | Proc. SPIE |
Volume: | 9231 |
First Page: | 92310M |
Year of first publication: | 2014 |
DOI: | https://doi.org/10.1117/12.2065941 |