Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM-simulation
Author: | Frank Scholze, Christian Laubis, Gerhard Ulm, Uwe Dersch, Jan Pomplun, Sven BurgerORCiD, Frank Schmidt |
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Editor: | Frank Schellenberg |
Document Type: | In Proceedings |
Parent Title (English): | Emerging Lithographic Technologies XII |
Volume: | 6921 |
Publisher: | SPIE |
Year of first publication: | 2008 |