The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks
Author: | Frank Scholze, Christian Laubis, Uwe Dersch, Jan Pomplun, Sven BurgerORCiD, Frank Schmidt |
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Editor: | Harald Bosse |
Document Type: | In Proceedings |
Parent Title (English): | Modeling Aspects in Optical Metrology |
Volume: | 6617 |
First Page: | 66171A |
Publisher: | Proc. SPIE |
Year of first publication: | 2007 |