Rigorous FEM-Simulation of EUV-Masks: Influence of shape and material parameters
Author: | Jan Pomplun, Sven BurgerORCiD, Frank Schmidt, Lin Zschiedrich, Frank Scholze |
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Editor: | P. Martin, R. Naber |
Document Type: | In Proceedings |
Parent Title (English): | Photomask Technology |
Volume: | 6349 |
First Page: | 63493D |
Publisher: | Proc. SPIE |
Year of first publication: | 2006 |
DOI: | https://doi.org/10.1117/12.686828 |