Rigorous Simulation of 3D Masks
Author: | Sven BurgerORCiD, Roderick Köhle, Lin Zschiedrich, H. Nguyen, Frank Schmidt, Reinhard März, Christoph Nölscher |
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Editor: | P. Martin, R. Naber |
Document Type: | In Proceedings |
Parent Title (English): | Photomask Technology |
Volume: | 6349 |
First Page: | 63494Z |
Publisher: | Proc. SPIE |
Year of first publication: | 2006 |
URL: | http://arxiv.org/pdf/physics/0610218 |