Benchmark of FEM, Waveguide and FDTD Algorithms for Rigorous Mask Simulation
Author: | Sven BurgerORCiD, Roderick Köhle, Lin Zschiedrich, W. Gao, Frank Schmidt, Reinhard März, Christoph Nölscher |
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Editor: | J. Weed, P. Martin |
Document Type: | In Proceedings |
Parent Title (English): | Photomask Technology |
Volume: | 5992 |
First Page: | 378 |
Last Page: | 389 |
Publisher: | Proc. SPIE |
Year of first publication: | 2005 |
ArXiv Id: | http://arxiv.org/abs/physics/0601143 |
DOI: | https://doi.org/10.1117/12.631696 |