Metrology of EUV masks by EUV-scatterometry and finite element analysis
Author: | Jan Pomplun, Sven BurgerORCiD, Frank Schmidt, Frank Scholze, Christian Laubis, Uwe Dersch |
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Editor: | Toshiyuki Horiuchi |
Document Type: | In Proceedings |
Parent Title (English): | Photomask and Next-Generation Lithography Mask Technology XV |
Volume: | 7028 |
Publisher: | SPIE |
Year of first publication: | 2008 |