Determination of line profiles on photomasks using DUV, EUV and X-ray scattering
| Author: | Frank Scholze, Bernd Bodermann, Sven BurgerORCiD, Johannes Endres, Anton Haase, Michael Krumrey, Christian Laubis, Victor Soltwisch, Albrecht Ullrich, Jan Wernecke |
|---|---|
| Document Type: | In Proceedings |
| Parent Title (English): | Proc. SPIE |
| Volume: | 9231 |
| First Page: | 92310M |
| Year of first publication: | 2014 |
| DOI: | https://doi.org/10.1117/12.2065941 |

