The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks
| Author: | Frank Scholze, Christian Laubis, Uwe Dersch, Jan Pomplun, Sven BurgerORCiD, Frank Schmidt |
|---|---|
| Editor: | Harald Bosse |
| Document Type: | In Proceedings |
| Parent Title (English): | Modeling Aspects in Optical Metrology |
| Volume: | 6617 |
| First Page: | 66171A |
| Publisher: | Proc. SPIE |
| Year of first publication: | 2007 |

