Metrology of EUV masks by EUV-scatterometry and finite element analysis
| Author: | Jan Pomplun, Sven BurgerORCiD, Frank Schmidt, Frank Scholze, Christian Laubis, Uwe Dersch |
|---|---|
| Editor: | Toshiyuki Horiuchi |
| Document Type: | In Proceedings |
| Parent Title (English): | Photomask and Next-Generation Lithography Mask Technology XV |
| Volume: | 7028 |
| Publisher: | SPIE |
| Year of first publication: | 2008 |

