Photomask linewidth measurement comparison including an improved model-based through-focus measurement approach
| Author: | Jan KrügerORCiD, Sven DopslaffORCiD, Phillip Manley, Detlef Bergmann, Rainer KöningORCiD, Gaoliang DaiORCiD, Kai HahmORCiD, Philipp-Immanuel SchneiderORCiD, Martin HammerschmidtORCiD, Lin Zschiedrich, Harald Bosse, Bernd Bodermann |
|---|---|
| Document Type: | Article |
| Parent Title (English): | Meas. Sci. Technol. |
| Volume: | 37 |
| First Page: | 095004 |
| Year of first publication: | 2026 |
| DOI: | https://doi.org/10.1088/1361-6501/ae44bb |

