TY - CHAP A1 - Burger, Sven A1 - Köhle, Roderick A1 - Zschiedrich, Lin A1 - Gao, W. A1 - Schmidt, Frank A1 - März, Reinhard A1 - Nölscher, Christoph ED - Weed, J. ED - Martin, P. T1 - Benchmark of FEM, Waveguide and FDTD Algorithms for Rigorous Mask Simulation T2 - Photomask Technology Y1 - 2005 U6 - https://doi.org/10.1117/12.631696 VL - 5992 SP - 378 EP - 389 PB - Proc. SPIE ER -