TY - CHAP A1 - Scholze, Frank A1 - Laubis, Christian A1 - Dersch, Uwe A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank ED - Bosse, Harald T1 - The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks T2 - Modeling Aspects in Optical Metrology Y1 - 2007 VL - 6617 SP - 66171A PB - Proc. SPIE ER - TY - CHAP A1 - Scholze, Frank A1 - Laubis, Christian A1 - Ulm, Gerhard A1 - Dersch, Uwe A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank ED - Schellenberg, Frank T1 - Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM-simulation T2 - Emerging Lithographic Technologies XII Y1 - 2008 VL - 6921 PB - SPIE ER - TY - CHAP A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank A1 - Scholze, Frank A1 - Laubis, Christian A1 - Dersch, Uwe ED - Horiuchi, Toshiyuki T1 - Metrology of EUV masks by EUV-scatterometry and finite element analysis T2 - Photomask and Next-Generation Lithography Mask Technology XV Y1 - 2008 VL - 7028 PB - SPIE ER - TY - CHAP A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank A1 - Scholze, Frank A1 - Laubis, Christian A1 - Dersch, Uwe ED - Bosse, Harald T1 - Finite element analysis of EUV lithography T2 - Modeling Aspects in Optical Metrology Y1 - 2007 U6 - https://doi.org/10.1117/12.726156 VL - 6617 SP - 661718 PB - Proc. SPIE ER -