TY - CHAP A1 - Agcos, Emil A1 - Bodermann, Bernd A1 - Burger, Sven A1 - Dai, Gaoliang A1 - Endres, Johannes A1 - Hansen, Poul-Erik A1 - Nielson, Lars A1 - Madsen, Morten A1 - Heidenreich, Sebastian A1 - Krumrey, Michael A1 - Loechel, Bernd A1 - Probst, Jürgen A1 - Scholze, Frank A1 - Soltwisch, Victor A1 - Wurm, Matthias T1 - Scatterometry reference standards to improve tool matching and traceability in lithographical nanomanufacturing T2 - Proc. SPIE Y1 - 2015 U6 - https://doi.org/10.1117/12.2190409 VL - 9556 SP - 955610 ER - TY - JOUR A1 - Farchmin, Nando A1 - Hammerschmidt, Martin A1 - Schneider, Philipp-Immanuel A1 - Wurm, Matthias A1 - Bodermann, Bernd A1 - Bär, Markus A1 - Heidenreich, Sebastian T1 - Efficient Bayesian inversion for shape reconstruction of lithography masks JF - J. Micro/Nanolith. MEMS MOEMS Y1 - 2020 U6 - https://doi.org/10.1117/1.JMM.19.2.024001 VL - 19 SP - 024001 ER - TY - JOUR A1 - Farchmin, Nando A1 - Hammerschmidt, Martin A1 - Schneider, Philipp-Immanuel A1 - Wurm, Matthias A1 - Bär, Markus A1 - Heidenreich, Sebastian T1 - Efficient global sensitivity analysis for silicon line gratings using polynomial chaos JF - Proc. SPIE Y1 - 2019 U6 - https://doi.org/10.1117/12.2525978 VL - 11057 SP - 110570J ER -